MOCVD of Lanthanum Oxides from La(tmhd)3 and La(tmod)3 Precursors: A Thermal and Kinetic Investigation
C. Bedoya
1
,
Guglielmo Guido Condorelli
1
,
S T Finocchiaro
1
,
A. Di Mauro
1
,
D Atanasio
1
,
I. L. Fragalà
1
,
L. Cattaneo
2
,
S Carella
2
1
2
Saes Getters S.p.A., Viale Italia 77, Lainate, I-20020 (Italy)
|
Publication type: Journal Article
Publication date: 2006-01-19
General Chemistry
Process Chemistry and Technology
Surfaces and Interfaces
Abstract
Metal-organic (MO)CVD processes using two different precursors, (La(tmhd)3 and La(tmod)3), have been investigated. In-situ Fourier transform infrared (FTIR) spectroscopy investigations and thermal analysis have provided information on their thermal robustness during the sublimation processes and mass-transport properties during MOCVD experiments. Both precursors can be efficiently vaporized in the temperature range 160–230 °C even though La(tmod)3 exhibits higher volatility. Lanthanum oxides have been efficiently deposited using a direct liquid injection (DLI) equipped MOCVD reactor in the temperature range 350–500 °C for both precursors. The effect of the addition of tetraglyme to the precursor solution has been evaluated. Films mainly consist of different phases of La2O3 and LaO(OH), while the carbon-containing La2O2CO3 phase was observed only on the surface, with no relevant carbon contamination being present in the bulk of the film.
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Total citations:
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Citations from 2024:
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(12%)
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GOST
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Bedoya C. et al. MOCVD of Lanthanum Oxides from La(tmhd)3 and La(tmod)3 Precursors: A Thermal and Kinetic Investigation // Chemical Vapor Deposition. 2006. Vol. 12. No. 1. pp. 46-53.
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Bedoya C., Condorelli G. G., Finocchiaro S. T., Di Mauro A., Atanasio D., Fragalà I. L., Cattaneo L., Carella S. MOCVD of Lanthanum Oxides from La(tmhd)3 and La(tmod)3 Precursors: A Thermal and Kinetic Investigation // Chemical Vapor Deposition. 2006. Vol. 12. No. 1. pp. 46-53.
Cite this
RIS
Copy
TY - JOUR
DO - 10.1002/cvde.200506391
UR - https://doi.org/10.1002/cvde.200506391
TI - MOCVD of Lanthanum Oxides from La(tmhd)3 and La(tmod)3 Precursors: A Thermal and Kinetic Investigation
T2 - Chemical Vapor Deposition
AU - Bedoya, C.
AU - Condorelli, Guglielmo Guido
AU - Finocchiaro, S T
AU - Di Mauro, A.
AU - Atanasio, D
AU - Fragalà, I. L.
AU - Cattaneo, L.
AU - Carella, S
PY - 2006
DA - 2006/01/19
PB - Wiley
SP - 46-53
IS - 1
VL - 12
SN - 0948-1907
SN - 1521-3862
ER -
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BibTex (up to 50 authors)
Copy
@article{2006_Bedoya,
author = {C. Bedoya and Guglielmo Guido Condorelli and S T Finocchiaro and A. Di Mauro and D Atanasio and I. L. Fragalà and L. Cattaneo and S Carella},
title = {MOCVD of Lanthanum Oxides from La(tmhd)3 and La(tmod)3 Precursors: A Thermal and Kinetic Investigation},
journal = {Chemical Vapor Deposition},
year = {2006},
volume = {12},
publisher = {Wiley},
month = {jan},
url = {https://doi.org/10.1002/cvde.200506391},
number = {1},
pages = {46--53},
doi = {10.1002/cvde.200506391}
}
Cite this
MLA
Copy
Bedoya, C., et al. “MOCVD of Lanthanum Oxides from La(tmhd)3 and La(tmod)3 Precursors: A Thermal and Kinetic Investigation.” Chemical Vapor Deposition, vol. 12, no. 1, Jan. 2006, pp. 46-53. https://doi.org/10.1002/cvde.200506391.