Soft Matter, volume 12, issue 4, pages 1256-1261
Photosensitivity of reflection notch tuning and broadening in polymer stabilized cholesteric liquid crystals.
1
Air Force Research Laboratory, Materials and Manufacturing Directorate, Wright-Patterson Air Force Base, Ohio 45433-7750, USA
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Publication type: Journal Article
Publication date: 2016-01-01
Journal:
Soft Matter
Quartile SCImago
Q1
Quartile WOS
Q2
Impact factor: 3.4
ISSN: 1744683X, 17446848
General Chemistry
Condensed Matter Physics
Abstract
The position or bandwidth of the selective reflection of polymer stabilized cholesteric liquid crystals (PSCLCs) prepared from negative dielectric anisotropy ("-Δε") liquid crystalline hosts can be shifted by applying a DC voltage. The underlying mechanism of the tuning or broadening of the reflection of PSCLCs detailed in these recent efforts is ion-facilitated, electromechanical deformation of the structurally chiral, polymer stabilizing network in the presence of a DC bias. Here, we show that these electro-optic responses can also be photosensitive. The photosensitivity is most directly related to the presence of photoinitiator, which is a known ionic contaminant to liquid crystal devices. Measurement of the ion density of a series of control compositions before, during, and after irradiation with UV light confirms that the ion density in compositions that exhibit photosensitivity is increased by irradiation and correlates to not only the concentration of the photoinitiator but also the type. Thus, the magnitude of the electrically tuned or broadened reflection of PSCLC of certain compositions when subjected to DC field is further increased in the presence of UV light. While interesting and potentially useful in applications such as architectural windows, the effect may be deleterious to some device implementations. Accordingly, compositions in which photosensitivity is not observed are identified.
Citations by journals
1
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5
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Journal of Polymer Science, Part B: Polymer Physics
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Applied Physics Express
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Applied Physics Express
1 publication, 3.7%
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Optics and Laser Technology
1 publication, 3.7%
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Nano Letters
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Nano Letters
1 publication, 3.7%
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ACS Omega
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1 publication, 3.7%
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1 publication, 3.7%
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Polymers
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Polymers
1 publication, 3.7%
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1
2
3
4
5
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Citations by publishers
1
2
3
4
5
6
7
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Taylor & Francis
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Taylor & Francis
7 publications, 25.93%
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Wiley
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Wiley
5 publications, 18.52%
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Multidisciplinary Digital Publishing Institute (MDPI)
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Multidisciplinary Digital Publishing Institute (MDPI)
5 publications, 18.52%
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American Chemical Society (ACS)
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American Chemical Society (ACS)
4 publications, 14.81%
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Optical Society of America
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Optical Society of America
2 publications, 7.41%
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Springer Nature
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Springer Nature
1 publication, 3.7%
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Japan Society of Applied Physics
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Japan Society of Applied Physics
1 publication, 3.7%
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Elsevier
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Elsevier
1 publication, 3.7%
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Royal Society of Chemistry (RSC)
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Royal Society of Chemistry (RSC)
1 publication, 3.7%
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1
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- We do not take into account publications that without a DOI.
- Statistics recalculated only for publications connected to researchers, organizations and labs registered on the platform.
- Statistics recalculated weekly.
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Lee K. Y., Tondiglia V. P., White T. P. Photosensitivity of reflection notch tuning and broadening in polymer stabilized cholesteric liquid crystals. // Soft Matter. 2016. Vol. 12. No. 4. pp. 1256-1261.
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Lee K. Y., Tondiglia V. P., White T. P. Photosensitivity of reflection notch tuning and broadening in polymer stabilized cholesteric liquid crystals. // Soft Matter. 2016. Vol. 12. No. 4. pp. 1256-1261.
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TY - JOUR
DO - 10.1039/C5SM01985K
UR - https://doi.org/10.1039%2FC5SM01985K
TI - Photosensitivity of reflection notch tuning and broadening in polymer stabilized cholesteric liquid crystals.
T2 - Soft Matter
AU - Tondiglia, Vincent P
AU - Lee, K Y
AU - White, T. P.
PY - 2016
DA - 2016/01/01 00:00:00
PB - Royal Society of Chemistry (RSC)
SP - 1256-1261
IS - 4
VL - 12
SN - 1744-683X
SN - 1744-6848
ER -
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@article{2016_Lee
author = {Vincent P Tondiglia and K Y Lee and T. P. White},
title = {Photosensitivity of reflection notch tuning and broadening in polymer stabilized cholesteric liquid crystals.},
journal = {Soft Matter},
year = {2016},
volume = {12},
publisher = {Royal Society of Chemistry (RSC)},
month = {jan},
url = {https://doi.org/10.1039%2FC5SM01985K},
number = {4},
pages = {1256--1261},
doi = {10.1039/C5SM01985K}
}
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Lee, K. Y., et al. “Photosensitivity of reflection notch tuning and broadening in polymer stabilized cholesteric liquid crystals..” Soft Matter, vol. 12, no. 4, Jan. 2016, pp. 1256-1261. https://doi.org/10.1039%2FC5SM01985K.