Soft Matter, volume 12, issue 4, pages 1256-1261

Photosensitivity of reflection notch tuning and broadening in polymer stabilized cholesteric liquid crystals.

Lee K Y 1
Tondiglia Vincent P 1
1
 
Air Force Research Laboratory, Materials and Manufacturing Directorate, Wright-Patterson Air Force Base, Ohio 45433-7750, USA
Publication typeJournal Article
Publication date2016-01-01
Journal: Soft Matter
Quartile SCImago
Q1
Quartile WOS
Q2
Impact factor3.4
ISSN1744683X, 17446848
General Chemistry
Condensed Matter Physics
Abstract
The position or bandwidth of the selective reflection of polymer stabilized cholesteric liquid crystals (PSCLCs) prepared from negative dielectric anisotropy ("-Δε") liquid crystalline hosts can be shifted by applying a DC voltage. The underlying mechanism of the tuning or broadening of the reflection of PSCLCs detailed in these recent efforts is ion-facilitated, electromechanical deformation of the structurally chiral, polymer stabilizing network in the presence of a DC bias. Here, we show that these electro-optic responses can also be photosensitive. The photosensitivity is most directly related to the presence of photoinitiator, which is a known ionic contaminant to liquid crystal devices. Measurement of the ion density of a series of control compositions before, during, and after irradiation with UV light confirms that the ion density in compositions that exhibit photosensitivity is increased by irradiation and correlates to not only the concentration of the photoinitiator but also the type. Thus, the magnitude of the electrically tuned or broadened reflection of PSCLC of certain compositions when subjected to DC field is further increased in the presence of UV light. While interesting and potentially useful in applications such as architectural windows, the effect may be deleterious to some device implementations. Accordingly, compositions in which photosensitivity is not observed are identified.

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Lee K. Y., Tondiglia V. P., White T. P. Photosensitivity of reflection notch tuning and broadening in polymer stabilized cholesteric liquid crystals. // Soft Matter. 2016. Vol. 12. No. 4. pp. 1256-1261.
GOST all authors (up to 50) Copy
Lee K. Y., Tondiglia V. P., White T. P. Photosensitivity of reflection notch tuning and broadening in polymer stabilized cholesteric liquid crystals. // Soft Matter. 2016. Vol. 12. No. 4. pp. 1256-1261.
RIS |
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RIS Copy
TY - JOUR
DO - 10.1039/C5SM01985K
UR - https://doi.org/10.1039%2FC5SM01985K
TI - Photosensitivity of reflection notch tuning and broadening in polymer stabilized cholesteric liquid crystals.
T2 - Soft Matter
AU - Tondiglia, Vincent P
AU - Lee, K Y
AU - White, T. P.
PY - 2016
DA - 2016/01/01 00:00:00
PB - Royal Society of Chemistry (RSC)
SP - 1256-1261
IS - 4
VL - 12
SN - 1744-683X
SN - 1744-6848
ER -
BibTex |
Cite this
BibTex Copy
@article{2016_Lee
author = {Vincent P Tondiglia and K Y Lee and T. P. White},
title = {Photosensitivity of reflection notch tuning and broadening in polymer stabilized cholesteric liquid crystals.},
journal = {Soft Matter},
year = {2016},
volume = {12},
publisher = {Royal Society of Chemistry (RSC)},
month = {jan},
url = {https://doi.org/10.1039%2FC5SM01985K},
number = {4},
pages = {1256--1261},
doi = {10.1039/C5SM01985K}
}
MLA
Cite this
MLA Copy
Lee, K. Y., et al. “Photosensitivity of reflection notch tuning and broadening in polymer stabilized cholesteric liquid crystals..” Soft Matter, vol. 12, no. 4, Jan. 2016, pp. 1256-1261. https://doi.org/10.1039%2FC5SM01985K.
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