Open Access
Open access
Polymers, volume 12, issue 4, pages 735

Modeling of Stripe Patterns in Photosensitive Azopolymers

Yadav Bharti 1
Domurath Jan 1
1
 
Leibniz-Institut für Polymerforschung, Hohe Straße 6, 01069 Dresden, Germany
Publication typeJournal Article
Publication date2020-03-26
Journal: Polymers
Quartile SCImago
Q1
Quartile WOS
Q1
Impact factor5
ISSN20734360
General Chemistry
Polymers and Plastics
Abstract
Placed at interfaces, azobenzene-containing materials show extraordinary phenomena when subjected to external light sources. Here we model the surface changes induced by one-dimensional Gaussian light fields in thin azopolymer films. Such fields can be produced in a quickly moving film irradiated with a strongly focused laser beam or illuminating the sample through a cylindrical lens. To explain the appearance of stripe patterns, we first calculate the unbalanced mechanical stresses induced by one-dimensional Gaussian fields in the interior of the film. In accordance with our orientation approach, the light-induced stress originates from the reorientation of azobenzenes that causes orientation of rigid backbone segments along the light polarization. The resulting volume forces have different signs and amplitude for light polarization directed perpendicular and parallel to the moving direction. Accordingly, the grooves are produced by the stretching forces and elongated protrusions by the compressive forces. Implementation into a viscoplastic model in a finite element software predicts a considerably weaker effect for the light polarized along the moving direction, in accordance with the experimental observations. The maximum value in the distribution of light-induced stresses becomes in this case very close to the yield stress which results in smaller surface deformations of the glassy azopolymer.

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Yadav B., Domurath J., Saphiannikova M. Modeling of Stripe Patterns in Photosensitive Azopolymers // Polymers. 2020. Vol. 12. No. 4. p. 735.
GOST all authors (up to 50) Copy
Yadav B., Domurath J., Saphiannikova M. Modeling of Stripe Patterns in Photosensitive Azopolymers // Polymers. 2020. Vol. 12. No. 4. p. 735.
RIS |
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RIS Copy
TY - JOUR
DO - 10.3390/polym12040735
UR - https://doi.org/10.3390%2Fpolym12040735
TI - Modeling of Stripe Patterns in Photosensitive Azopolymers
T2 - Polymers
AU - Yadav, Bharti
AU - Domurath, Jan
AU - Saphiannikova, M
PY - 2020
DA - 2020/03/26 00:00:00
PB - Multidisciplinary Digital Publishing Institute (MDPI)
SP - 735
IS - 4
VL - 12
PMID - 32224848
SN - 2073-4360
ER -
BibTex |
Cite this
BibTex Copy
@article{2020_Yadav,
author = {Bharti Yadav and Jan Domurath and M Saphiannikova},
title = {Modeling of Stripe Patterns in Photosensitive Azopolymers},
journal = {Polymers},
year = {2020},
volume = {12},
publisher = {Multidisciplinary Digital Publishing Institute (MDPI)},
month = {mar},
url = {https://doi.org/10.3390%2Fpolym12040735},
number = {4},
pages = {735},
doi = {10.3390/polym12040735}
}
MLA
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MLA Copy
Yadav, Bharti, et al. “Modeling of Stripe Patterns in Photosensitive Azopolymers.” Polymers, vol. 12, no. 4, Mar. 2020, p. 735. https://doi.org/10.3390%2Fpolym12040735.
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