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Applied Surface Science, volume 433, pages 582-588

XPS study of the surface chemistry of UO 2 (111) single crystal film

Kalmykov Stepan N.
Petrov Vladimir G
Teterin Yury A 2, 3
Popel Aleksej J 4, 5
Teterin Anton Yu 3
Ivanov Kirill E 3
Farnan Ian 6
Springell Ross
Scott Thomas B
Springell R. 7
Scott Thomas B. 8
3
 
NRC Kurchatov Institute
7
 
Interface Analysis Centre School of Physics University of Bristol Bristol BS8 1TL UK
8
 
The Bristol Centre for Nanoscience and Quantum Information
Publication typeJournal Article
Publication date2018-03-01
Quartile SCImago
Q1
Quartile WOS
Q1
Impact factor6.7
ISSN01694332
Surfaces, Coatings and Films
General Chemistry
General Physics and Astronomy
Condensed Matter Physics
Surfaces and Interfaces
Abstract
Abstract A (111) air-exposed surface of UO 2 thin film (150 nm) on (111) YSZ (yttria-stabilized zirconia) before and after the Ar + etching and subsequent in situ annealing in the spectrometer analytic chamber was studied by XPS technique. The U 5f, U 4f and O 1s electron peak intensities were employed for determining the oxygen coefficient k O  = 2 +  x of a UO 2+ x oxide on the surface. It was found that initial surface (several nm) had k O  = 2.20. A 20 s Ar + etching led to formation of oxide UO 2.12 , whose composition does not depend significantly on the etching time (up to 180 s). Ar + etching and subsequent annealing at temperatures 100–380 °C in vacuum was established to result in formation of stable well-organized structure UO 2.12 reflected in the U 4f XPS spectra as high intensity (∼28% of the basic peak) shake-up satellites 6.9 eV away from the basic peaks, and virtually did not change the oxygen coefficient of the sample surface. This agrees with the suggestion that a stable (self-assembling) phase with the oxygen coefficient k O  ≈ 2.12 forms on the UO 2 surface.

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Maslakov K. et al. XPS study of the surface chemistry of UO 2 (111) single crystal film // Applied Surface Science. 2018. Vol. 433. pp. 582-588.
GOST all authors (up to 50) Copy
Maslakov K., Teterin Y. A., Popel A. J., Teterin A. Yu., Ivanov K. E., Kalmykov S. N., Petrov V. G., Springell R., Scott T. B., Farnan I., Kalmykov S. N., Petrov V. G., Springell R., Scott T. B. XPS study of the surface chemistry of UO 2 (111) single crystal film // Applied Surface Science. 2018. Vol. 433. pp. 582-588.
RIS |
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RIS Copy
TY - JOUR
DO - 10.1016/j.apsusc.2017.10.019
UR - https://doi.org/10.1016%2Fj.apsusc.2017.10.019
TI - XPS study of the surface chemistry of UO 2 (111) single crystal film
T2 - Applied Surface Science
AU - Maslakov, Konstantin
AU - Teterin, Yury A
AU - Popel, Aleksej J
AU - Teterin, Anton Yu
AU - Ivanov, Kirill E
AU - Kalmykov, Stepan N.
AU - Petrov, Vladimir G
AU - Springell, Ross
AU - Scott, Thomas B
AU - Farnan, Ian
AU - Kalmykov, Stepan N.
AU - Petrov, Vladimir G
AU - Springell, R.
AU - Scott, Thomas B.
PY - 2018
DA - 2018/03/01 00:00:00
PB - Elsevier
SP - 582-588
VL - 433
SN - 0169-4332
ER -
BibTex
Cite this
BibTex Copy
@article{2018_Maslakov,
author = {Konstantin Maslakov and Yury A Teterin and Aleksej J Popel and Anton Yu Teterin and Kirill E Ivanov and Stepan N. Kalmykov and Vladimir G Petrov and Ross Springell and Thomas B Scott and Ian Farnan and Stepan N. Kalmykov and Vladimir G Petrov and R. Springell and Thomas B. Scott},
title = {XPS study of the surface chemistry of UO 2 (111) single crystal film},
journal = {Applied Surface Science},
year = {2018},
volume = {433},
publisher = {Elsevier},
month = {mar},
url = {https://doi.org/10.1016%2Fj.apsusc.2017.10.019},
pages = {582--588},
doi = {10.1016/j.apsusc.2017.10.019}
}
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