Self‐Templating Approaches to Hollow Nanostructures
Тип публикации: Journal Article
Дата публикации: 2018-08-28
scimago Q1
wos Q1
white level БС1
SJR: 8.851
CiteScore: 39.4
Impact factor: 26.8
ISSN: 09359648, 15214095
PubMed ID:
30155924
General Materials Science
Mechanical Engineering
Mechanics of Materials
Краткое описание
This current research progress on the fabrication of hollow nanostructures by using self-templating methods is reviewed. After a brief introduction to the unique properties and applications of hollow nanostructures and the three general fabrication routes, the discussions are focused on the five main self-templating strategies, including galvanic replacement, the Kirkendall effect, Ostwald ripening, dissolution–regrowth, and the surface-protected hollowing process. Some newly developed synthetic routes are selected and discussed in detail. In conclusion, a summary and the perspectives on the directions that might lead the future development of this exciting field are presented.
Найдено
Ничего не найдено, попробуйте изменить настройки фильтра.
Для доступа к списку цитирований публикации необходимо авторизоваться.
Для доступа к списку профилей, цитирующих публикацию, необходимо авторизоваться.
Топ-30
Журналы
|
2
4
6
8
10
12
|
|
|
Journal of Materials Chemistry A
11 публикаций, 5.56%
|
|
|
ACS applied materials & interfaces
10 публикаций, 5.05%
|
|
|
Small
9 публикаций, 4.55%
|
|
|
Chemical Engineering Journal
8 публикаций, 4.04%
|
|
|
Applied Surface Science
5 публикаций, 2.53%
|
|
|
Advanced Functional Materials
5 публикаций, 2.53%
|
|
|
Chemistry of Materials
4 публикации, 2.02%
|
|
|
ACS Nano
4 публикации, 2.02%
|
|
|
Nano Research
4 публикации, 2.02%
|
|
|
Journal of Alloys and Compounds
4 публикации, 2.02%
|
|
|
Coordination Chemistry Reviews
4 публикации, 2.02%
|
|
|
Journal of Energy Storage
4 публикации, 2.02%
|
|
|
Advanced Materials
4 публикации, 2.02%
|
|
|
Journal of Colloid and Interface Science
3 публикации, 1.52%
|
|
|
Advanced Energy Materials
3 публикации, 1.52%
|
|
|
Angewandte Chemie
3 публикации, 1.52%
|
|
|
Angewandte Chemie - International Edition
3 публикации, 1.52%
|
|
|
Langmuir
3 публикации, 1.52%
|
|
|
Nanoscale
3 публикации, 1.52%
|
|
|
Chemical Society Reviews
3 публикации, 1.52%
|
|
|
Molecules
2 публикации, 1.01%
|
|
|
Ionics
2 публикации, 1.01%
|
|
|
Journal of Power Sources
2 публикации, 1.01%
|
|
|
Electrochimica Acta
2 публикации, 1.01%
|
|
|
Colloids and Surfaces A: Physicochemical and Engineering Aspects
2 публикации, 1.01%
|
|
|
ChemNanoMat
2 публикации, 1.01%
|
|
|
ChemCatChem
2 публикации, 1.01%
|
|
|
Journal of Physical Chemistry Letters
2 публикации, 1.01%
|
|
|
Accounts of Chemical Research
2 публикации, 1.01%
|
|
|
New Journal of Chemistry
2 публикации, 1.01%
|
|
|
2
4
6
8
10
12
|
Издатели
|
10
20
30
40
50
60
70
|
|
|
Elsevier
64 публикации, 32.32%
|
|
|
Wiley
42 публикации, 21.21%
|
|
|
American Chemical Society (ACS)
32 публикации, 16.16%
|
|
|
Royal Society of Chemistry (RSC)
29 публикаций, 14.65%
|
|
|
Springer Nature
18 публикаций, 9.09%
|
|
|
MDPI
5 публикаций, 2.53%
|
|
|
The Electrochemical Society
1 публикация, 0.51%
|
|
|
Frontiers Media S.A.
1 публикация, 0.51%
|
|
|
Nonferrous Metals Society of China
1 публикация, 0.51%
|
|
|
IOP Publishing
1 публикация, 0.51%
|
|
|
ITMO University
1 публикация, 0.51%
|
|
|
American Physical Society (APS)
1 публикация, 0.51%
|
|
|
Autonomous Non-profit Organization Editorial Board of the journal Uspekhi Khimii
1 публикация, 0.51%
|
|
|
World Scientific
1 публикация, 0.51%
|
|
|
10
20
30
40
50
60
70
|
- Мы не учитываем публикации, у которых нет DOI.
- Статистика публикаций обновляется еженедельно.
Вы ученый?
Создайте профиль, чтобы получать персональные рекомендации коллег, конференций и новых статей.
Метрики
198
Всего цитирований:
198
Цитирований c 2025:
32
(16.16%)
Цитировать
ГОСТ |
RIS |
BibTex |
MLA
Цитировать
ГОСТ
Скопировать
Ji F., Yin Y. Self‐Templating Approaches to Hollow Nanostructures // Advanced Materials. 2018. Vol. 31. No. 38. p. 1802349.
ГОСТ со всеми авторами (до 50)
Скопировать
Ji F., Yin Y. Self‐Templating Approaches to Hollow Nanostructures // Advanced Materials. 2018. Vol. 31. No. 38. p. 1802349.
Цитировать
RIS
Скопировать
TY - JOUR
DO - 10.1002/adma.201802349
UR - https://doi.org/10.1002/adma.201802349
TI - Self‐Templating Approaches to Hollow Nanostructures
T2 - Advanced Materials
AU - Ji, Feng
AU - Yin, Yadong
PY - 2018
DA - 2018/08/28
PB - Wiley
SP - 1802349
IS - 38
VL - 31
PMID - 30155924
SN - 0935-9648
SN - 1521-4095
ER -
Цитировать
BibTex (до 50 авторов)
Скопировать
@article{2018_Ji,
author = {Feng Ji and Yadong Yin},
title = {Self‐Templating Approaches to Hollow Nanostructures},
journal = {Advanced Materials},
year = {2018},
volume = {31},
publisher = {Wiley},
month = {aug},
url = {https://doi.org/10.1002/adma.201802349},
number = {38},
pages = {1802349},
doi = {10.1002/adma.201802349}
}
Цитировать
MLA
Скопировать
Ji, Feng, and Yadong Yin. “Self‐Templating Approaches to Hollow Nanostructures.” Advanced Materials, vol. 31, no. 38, Aug. 2018, p. 1802349. https://doi.org/10.1002/adma.201802349.
Ошибка в публикации?
