Ge2Sb2Te5 thin film as a promising heat‐mode resist for high‐resolution direct laser writing lithography
Тип публикации: Journal Article
Дата публикации: 2023-08-22
scimago Q2
wos Q3
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SJR: 0.609
CiteScore: 5.1
Impact factor: 2
ISSN: 18626254, 18626270
Condensed Matter Physics
General Materials Science
Краткое описание
Ge2Sb2Te5 thin film is investigated as a positive heat‐mode resist and environmentally‐friendlily FeCl3 solution is as means an efficient developer. The corrosion selectivity of exposed to as‐deposited thin film reaches 2.3 and the etching selectivity of Si to Ge2Sb2Te5 thin film is as high as 15.75. Moreover, high‐resolution nanostructures with minimum linewidth of 180 nm and period of 400 nm are obtained along with high resolution of 130 nm. In addition, the mechanism of corrosion selectivity between as‐deposited and exposed thin film is further elucidated based on microstructural analysis. Hence, Ge2Sb2Te5 thin film is a promising positive resist for high‐resolution direct laser writing lithography.
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Chen X. et al. Ge2Sb2Te5 thin film as a promising heat‐mode resist for high‐resolution direct laser writing lithography // Physica Status Solidi - Rapid Research Letters. 2023.
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Chen X., Chen L., Sun L., Wei T., Ling Y., Hu Jing, Cheng M., Liu Q., Wang R., Li W., Liu B. Ge2Sb2Te5 thin film as a promising heat‐mode resist for high‐resolution direct laser writing lithography // Physica Status Solidi - Rapid Research Letters. 2023.
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TY - JOUR
DO - 10.1002/pssr.202300262
UR - https://doi.org/10.1002/pssr.202300262
TI - Ge2Sb2Te5 thin film as a promising heat‐mode resist for high‐resolution direct laser writing lithography
T2 - Physica Status Solidi - Rapid Research Letters
AU - Chen, Xingwang
AU - Chen, Lei
AU - Sun, Lihao
AU - Wei, Tao
AU - Ling, Yun
AU - Hu Jing
AU - Cheng, Miao
AU - Liu, Qianqian
AU - Wang, Ruirui
AU - Li, Wanfei
AU - Liu, Bo
PY - 2023
DA - 2023/08/22
PB - Wiley
SN - 1862-6254
SN - 1862-6270
ER -
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@article{2023_Chen,
author = {Xingwang Chen and Lei Chen and Lihao Sun and Tao Wei and Yun Ling and Hu Jing and Miao Cheng and Qianqian Liu and Ruirui Wang and Wanfei Li and Bo Liu},
title = {Ge2Sb2Te5 thin film as a promising heat‐mode resist for high‐resolution direct laser writing lithography},
journal = {Physica Status Solidi - Rapid Research Letters},
year = {2023},
publisher = {Wiley},
month = {aug},
url = {https://doi.org/10.1002/pssr.202300262},
doi = {10.1002/pssr.202300262}
}
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