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Applied Physics A: Materials Science and Processing, volume 93, issue 1, pages 183-188

Formation of Si structure in glass with a femtosecond laser

Publication typeJournal Article
Publication date2008-06-06
Quartile SCImago
Q2
Quartile WOS
Q2
Impact factor2.7
ISSN09478396, 14320630
General Chemistry
General Materials Science
Abstract
Mixing metallic Al into the starting material for silicate glass is proposed as a means of forming Si structures in glass. We confirmed that Si nanocrystals are space-selectively deposited in silicate glass via a thermite reaction triggered by femtosecond laser pulses. Small Si particles were transformed into larger, but still micrometer sized, Si particles by laser irradiation. These structures grew to micro-size particles due to the thermite reaction promoted by heat treatment. We discuss what effect the irradiation of the focused laser pulse had on the Si deposition process in the laser-irradiated region. Localized high temperatures and pressures and generation of shock waves appear to be very important in forming Si-rich structures that contribute to the growth of Si particles. The diffusion of calcium ions by the generation of shock waves and the presence of Al-rich structures is important for forming Si-rich structures such as Si clusters, which is achieved by continuously breaking Si–O bonds using localized high temperatures.

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GOST |
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GOST Copy
Miura K. et al. Formation of Si structure in glass with a femtosecond laser // Applied Physics A: Materials Science and Processing. 2008. Vol. 93. No. 1. pp. 183-188.
GOST all authors (up to 50) Copy
Miura K., Hirao K., SHIMOTSUMA Y., Sakakura M., Kanehira S. Formation of Si structure in glass with a femtosecond laser // Applied Physics A: Materials Science and Processing. 2008. Vol. 93. No. 1. pp. 183-188.
RIS |
Cite this
RIS Copy
TY - JOUR
DO - 10.1007/s00339-008-4660-6
UR - http://link.springer.com/10.1007/s00339-008-4660-6
TI - Formation of Si structure in glass with a femtosecond laser
T2 - Applied Physics A: Materials Science and Processing
AU - Miura, Kiyotaka
AU - Hirao, Kazuyuki
AU - SHIMOTSUMA, YASUHIKO
AU - Sakakura, Masaaki
AU - Kanehira, Shingo
PY - 2008
DA - 2008/06/06 00:00:00
PB - Springer Nature
SP - 183-188
IS - 1
VL - 93
SN - 0947-8396
SN - 1432-0630
ER -
BibTex |
Cite this
BibTex Copy
@article{2008_Miura,
author = {Kiyotaka Miura and Kazuyuki Hirao and YASUHIKO SHIMOTSUMA and Masaaki Sakakura and Shingo Kanehira},
title = {Formation of Si structure in glass with a femtosecond laser},
journal = {Applied Physics A: Materials Science and Processing},
year = {2008},
volume = {93},
publisher = {Springer Nature},
month = {jun},
url = {http://link.springer.com/10.1007/s00339-008-4660-6},
number = {1},
pages = {183--188},
doi = {10.1007/s00339-008-4660-6}
}
MLA
Cite this
MLA Copy
Miura, Kiyotaka, et al. “Formation of Si structure in glass with a femtosecond laser.” Applied Physics A: Materials Science and Processing, vol. 93, no. 1, Jun. 2008, pp. 183-188. http://link.springer.com/10.1007/s00339-008-4660-6.
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