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volume 104 issue 2 pages 701-705

Topological evolution of self-induced silicon nanogratings during prolonged femtosecond laser irradiation

Publication typeJournal Article
Publication date2011-02-11
scimago Q2
wos Q2
SJR0.486
CiteScore4.9
Impact factor2.8
ISSN09478396, 14320630
General Chemistry
General Materials Science
Abstract
Gradual evolution of self-induced silicon surface topology from one-dimensional ridge-like to two-dimensional spike-like nanogratings and then to isotropic sets of micro-columns was observed by evenly increasing IR and UV femtosecond laser irradiation dose. This topological evolution exhibits clear indications of consequent melting and vaporization processes being set up during the prolonged laser irradiation. Monotonously decreasing cumulative IR and UV femtosecond laser-nanostructuring thresholds may indicate an increase of optical absorbance of the laser-nanostructured silicon surfaces versus the increasing laser dose, consistent with the consequent onset of the abovementioned thermal modification processes.
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GOST Copy
Golosov E. V. et al. Topological evolution of self-induced silicon nanogratings during prolonged femtosecond laser irradiation // Applied Physics A: Materials Science and Processing. 2011. Vol. 104. No. 2. pp. 701-705.
GOST all authors (up to 50) Copy
Golosov E. V., Ionin A. A., Kolobov Y., Kudryashov S. I., Ligachev A. E., Makarov S., Novoselov Y. N., Seleznev L. V., Sinitsyn D. V. Topological evolution of self-induced silicon nanogratings during prolonged femtosecond laser irradiation // Applied Physics A: Materials Science and Processing. 2011. Vol. 104. No. 2. pp. 701-705.
RIS |
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RIS Copy
TY - JOUR
DO - 10.1007/s00339-011-6323-2
UR - https://doi.org/10.1007/s00339-011-6323-2
TI - Topological evolution of self-induced silicon nanogratings during prolonged femtosecond laser irradiation
T2 - Applied Physics A: Materials Science and Processing
AU - Golosov, E. V.
AU - Ionin, A. A.
AU - Kolobov, Y.R
AU - Kudryashov, S. I.
AU - Ligachev, A. E.
AU - Makarov, S.V.
AU - Novoselov, Y N
AU - Seleznev, L V
AU - Sinitsyn, D V
PY - 2011
DA - 2011/02/11
PB - Springer Nature
SP - 701-705
IS - 2
VL - 104
SN - 0947-8396
SN - 1432-0630
ER -
BibTex |
Cite this
BibTex (up to 50 authors) Copy
@article{2011_Golosov,
author = {E. V. Golosov and A. A. Ionin and Y.R Kolobov and S. I. Kudryashov and A. E. Ligachev and S.V. Makarov and Y N Novoselov and L V Seleznev and D V Sinitsyn},
title = {Topological evolution of self-induced silicon nanogratings during prolonged femtosecond laser irradiation},
journal = {Applied Physics A: Materials Science and Processing},
year = {2011},
volume = {104},
publisher = {Springer Nature},
month = {feb},
url = {https://doi.org/10.1007/s00339-011-6323-2},
number = {2},
pages = {701--705},
doi = {10.1007/s00339-011-6323-2}
}
MLA
Cite this
MLA Copy
Golosov, E. V., et al. “Topological evolution of self-induced silicon nanogratings during prolonged femtosecond laser irradiation.” Applied Physics A: Materials Science and Processing, vol. 104, no. 2, Feb. 2011, pp. 701-705. https://doi.org/10.1007/s00339-011-6323-2.