Open Access
Open access
Springer Nature
Applied Physics A: Materials Science and Processing
,  volume 122 ,  issue 5 ,  publication number 505

Structural and nanomechanical characterization of niobium films deposited by DC magnetron sputtering

X. Li 1
, 
W H Cao 2
, 
X F Tao 1
, 
L-L Ren 1
, 
L.Q. Zhou 3
, 
G. F. XU 3
1
 
Division of Nano Metrology and Materials Measurement, National Institute of Metrology, Beijing, China | 
2
 
Division of Electricity and Magnetism, National Institute of Metrology, Beijing, China | 
3
 
Publication type: Journal Article
Publication date: 2016-04-12
Springer Nature
scimago Q2
wos Q2
SJR: 0.486
CiteScore: 4.9
Impact factor: 2.8
ISSN: 09478396, 14320630
General Chemistry
General Materials Science
Abstract
Nb thin films were deposited onto Si wafers by direct current (DC) magnetron sputtering at different deposition pressures. The microstructure and nanomechanical properties of Nb films were investigated by scanning electron microscope, X-ray diffractometer, transmission electron microscope, atomic force microscope and nanoindenter. The results revealed that the grain size, thickness, surface roughness, the reduced elastic modulus (Er) and hardness (H) values of Nb thin films increased at the pressure range of 0.61–0.68 Pa. Meanwhile, the porosity of Nb films decreased with the increase in deposition pressure. The lattice deformation of Nb thin films changed from negative to positive with the increase in deposition pressure. It is concluded that deposition pressure influences the microstructure and nanomechanical properties of Nb films.
Found 
Found 

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GOST Copy
Li X. et al. Structural and nanomechanical characterization of niobium films deposited by DC magnetron sputtering // Applied Physics A: Materials Science and Processing. 2016. Vol. 122. No. 5. 505
GOST all authors (up to 50) Copy
Li X., Cao W. H., Tao X. F., Ren L., Zhou L., XU G. F. Structural and nanomechanical characterization of niobium films deposited by DC magnetron sputtering // Applied Physics A: Materials Science and Processing. 2016. Vol. 122. No. 5. 505
RIS |
Cite this
RIS Copy
TY - JOUR
DO - 10.1007/s00339-016-9990-1
UR - https://doi.org/10.1007/s00339-016-9990-1
TI - Structural and nanomechanical characterization of niobium films deposited by DC magnetron sputtering
T2 - Applied Physics A: Materials Science and Processing
AU - Li, X.
AU - Cao, W H
AU - Tao, X F
AU - Ren, L-L
AU - Zhou, L.Q.
AU - XU, G. F.
PY - 2016
DA - 2016/04/12
PB - Springer Nature
IS - 5
VL - 122
SN - 0947-8396
SN - 1432-0630
ER -
BibTex
Cite this
BibTex (up to 50 authors) Copy
@article{2016_Li,
author = {X. Li and W H Cao and X F Tao and L-L Ren and L.Q. Zhou and G. F. XU},
title = {Structural and nanomechanical characterization of niobium films deposited by DC magnetron sputtering},
journal = {Applied Physics A: Materials Science and Processing},
year = {2016},
volume = {122},
publisher = {Springer Nature},
month = {apr},
url = {https://doi.org/10.1007/s00339-016-9990-1},
number = {5},
pages = {505},
doi = {10.1007/s00339-016-9990-1}
}