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Applied Physics A: Materials Science and Processing

, том 122 , издание 5 , номер публикации 505

Structural and nanomechanical characterization of niobium films deposited by DC magnetron sputtering

Тип публикации: Journal Article

Дата публикации: 2016-04-12

Springer Nature

Applied Physics A: Materials Science and Processing

SCImago Q2

WOS Q2

БС2

SJR: 0.474

CiteScore: 4.9

Impact factor: 2.8

ISSN: 09478396, 14320630

DOI: 10.1007/s00339-016-9990-1

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General Chemistry

General Materials Science

Краткое описание

Nb thin films were deposited onto Si wafers by direct current (DC) magnetron sputtering at different deposition pressures. The microstructure and nanomechanical properties of Nb films were investigated by scanning electron microscope, X-ray diffractometer, transmission electron microscope, atomic force microscope and nanoindenter. The results revealed that the grain size, thickness, surface roughness, the reduced elastic modulus (Er) and hardness (H) values of Nb thin films increased at the pressure range of 0.61–0.68 Pa. Meanwhile, the porosity of Nb films decreased with the increase in deposition pressure. The lattice deformation of Nb thin films changed from negative to positive with the increase in deposition pressure. It is concluded that deposition pressure influences the microstructure and nanomechanical properties of Nb films.

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ГОСТ Скопировать

Li X. et al. Structural and nanomechanical characterization of niobium films deposited by DC magnetron sputtering // Applied Physics A: Materials Science and Processing. 2016. Vol. 122. No. 5. 505

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Li X., Cao W. H., Tao X. F., Ren L., Zhou L., XU G. F. Structural and nanomechanical characterization of niobium films deposited by DC magnetron sputtering // Applied Physics A: Materials Science and Processing. 2016. Vol. 122. No. 5. 505

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TY - JOUR

DO - 10.1007/s00339-016-9990-1

UR - https://doi.org/10.1007/s00339-016-9990-1

TI - Structural and nanomechanical characterization of niobium films deposited by DC magnetron sputtering

T2 - Applied Physics A: Materials Science and Processing

AU - Li, X.

AU - Cao, W H

AU - Tao, X F

AU - Ren, L-L

AU - Zhou, L.Q.

AU - XU, G. F.

PY - 2016

DA - 2016/04/12

PB - Springer Nature

IS - 5

VL - 122

SN - 0947-8396

SN - 1432-0630

ER -

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@article{2016_Li,

author = {X. Li and W H Cao and X F Tao and L-L Ren and L.Q. Zhou and G. F. XU},

title = {Structural and nanomechanical characterization of niobium films deposited by DC magnetron sputtering},

journal = {Applied Physics A: Materials Science and Processing},

year = {2016},

volume = {122},

publisher = {Springer Nature},

month = {apr},

url = {https://doi.org/10.1007/s00339-016-9990-1},

number = {5},

pages = {505},

doi = {10.1007/s00339-016-9990-1}

}

Издатель

Springer Nature

Журнал

Applied Physics A: Materials Science and Processing

SCImago Q2

WOS Q2

БС2

SJR

0.474

CiteScore

4.9

Impact factor

2.8

ISSN

09478396 (Print)

14320630 (Electronic)

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