Materials Research Bulletin, volume 154, pages 111943

Transfer- and lithography-free CVD of N-doped graphenic carbon thin films on non-metal substrates

Sedlovets D. M. ¹

Red’kin A. A. ¹

Kabachkov Eugene N ^{2, 3}

Naumov Anton P. ¹

Knyazev Maxim A ¹

Moiseenko A V ⁴

Korepanov Vitaly ¹

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Institute of Microelectronics Technology and High-purity Materials, Russian Academy of Science (IMT RAS), 6 Academician Ossipyan str., Chernogolovka, Moscow 142432 Russian Federation |

Chernogolovka Scientific Center, Russian Academy of Sciences, Chernogolovka, Moscow 142432, Russian Federation |

Institute of Problems of Chemical Physics of Russian Academy of Sciences (IPCP RAS), 1 Academician Semenov av., Chernogolovka, Moscow 142432 Russian Federation |

⁴

Laboratory of Electron Microscopy, Faculty of Biology, Lomonosov Moscow State University, Moscow 119991, Russian Federation |

Publication type: Journal Article

Publication date: 2022-10-01

Elsevier

Journal: Materials Research Bulletin

Quartile SCImago

Quartile WOS

Impact factor: 5.4

ISSN: 00255408

DOI: 10.1016/j.materresbull.2022.111943

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Condensed Matter Physics

General Materials Science

Mechanical Engineering

Mechanics of Materials

Abstract

• Acetonitrile CVD is a promising approach to the synthesis of N-graphene-like films. • Synthesis temperature varying allows regulating the types of carbon-nitrogen bonding. • Both optical and electrical properties show very good applied quality of the films. • Resistless N-graphene-like films microstructuring is demonstrated for the first time. Although CVD is a very promising approach to the synthesis of nitrogen-doped graphenic carbon thin films (N-GCTFs), the vast majority of methods require the use of a metal catalyst, and a post-deposition transfer process, which complicates the technology, as well as damages and contaminates the films. Here, we described a simple, low-cost and scalable approach for the completely direct (transfer- and lithography-free) deposition of N-GCTFs on dielectric substrates through pyrolysis of acetonitrile (CH 3 CN). GCTFs are defined as multi-layer graphene films with few-nm thickness. The N/C ratio is about 2–3%, and nitrogen is mainly contained in the graphitic form. Raman spectroscopy and TEM indicate a nanocrystalline structure of the films. The values of transmittance and sheet resistance are found significantly depending on the synthesis temperature and time. The films can be grown selectively on the e-beam pre-patterned areas of the substrates. We demonstrate this by lithography-free growing of N-GCTF microstructure.

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Citations by journals

	1 2
Materials	Materials, 2, 66.67% Materials 2 publications, 66.67%
Nano-Structures and Nano-Objects	Nano-Structures and Nano-Objects, 1, 33.33% Nano-Structures and Nano-Objects 1 publication, 33.33%
	1 2

Citations by publishers

	1 2
Multidisciplinary Digital Publishing Institute (MDPI)	Multidisciplinary Digital Publishing Institute (MDPI), 2, 66.67% Multidisciplinary Digital Publishing Institute (MDPI) 2 publications, 66.67%
Elsevier	Elsevier, 1, 33.33% Elsevier 1 publication, 33.33%
	1 2

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Sedlovets D. M. et al. Transfer- and lithography-free CVD of N-doped graphenic carbon thin films on non-metal substrates // Materials Research Bulletin. 2022. Vol. 154. p. 111943.

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Sedlovets D. M., Red’kin A. A., Kabachkov E. N., Naumov A. P., Knyazev M. A., Moiseenko A. V., Korepanov V. Transfer- and lithography-free CVD of N-doped graphenic carbon thin films on non-metal substrates // Materials Research Bulletin. 2022. Vol. 154. p. 111943.

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RIS Copy

TY - JOUR

DO - 10.1016/j.materresbull.2022.111943

UR - https://doi.org/10.1016%2Fj.materresbull.2022.111943

TI - Transfer- and lithography-free CVD of N-doped graphenic carbon thin films on non-metal substrates

T2 - Materials Research Bulletin

AU - Sedlovets, D. M.

AU - Red’kin, A. A.

AU - Kabachkov, Eugene N

AU - Naumov, Anton P.

AU - Knyazev, Maxim A

AU - Moiseenko, A V

AU - Korepanov, Vitaly

PY - 2022

DA - 2022/10/01 00:00:00

PB - Elsevier

SP - 111943

VL - 154

SN - 0025-5408

ER -

BibTex

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BibTex Copy

@article{2022_Sedlovets,

author = {D. M. Sedlovets and A. A. Red’kin and Eugene N Kabachkov and Anton P. Naumov and Maxim A Knyazev and A V Moiseenko and Vitaly Korepanov},

title = {Transfer- and lithography-free CVD of N-doped graphenic carbon thin films on non-metal substrates},

journal = {Materials Research Bulletin},

year = {2022},

volume = {154},

publisher = {Elsevier},

month = {oct},

url = {https://doi.org/10.1016%2Fj.materresbull.2022.111943},

pages = {111943},

doi = {10.1016/j.materresbull.2022.111943}

}

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Publisher

Elsevier

Journal

Materials Research Bulletin

Quartile SCImago

Quartile WOS

Impact factor

5.4

ISSN

00255408 (Print)

Labs

Experimental and Technological Laboratory (Laboratory No. 5)

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