Selective nitride passivation using vapor-dosed aldehyde inhibitors for area-selective atomic layer deposition
Publication type: Journal Article
Publication date: 2024-07-01
scimago Q2
wos Q3
SJR: 0.591
CiteScore: 5.4
Impact factor: 2.7
ISSN: 0167577X, 18734979
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Metrics
9
Total citations:
9
Citations from 2024:
9
(100%)
The most citing journal
Citations in journal:
1
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GOST
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Park H. et al. Selective nitride passivation using vapor-dosed aldehyde inhibitors for area-selective atomic layer deposition // Materials Letters. 2024. Vol. 366. p. 136570.
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Park H., Oh J., Lee J. M., Kim W. Selective nitride passivation using vapor-dosed aldehyde inhibitors for area-selective atomic layer deposition // Materials Letters. 2024. Vol. 366. p. 136570.
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RIS
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TY - JOUR
DO - 10.1016/j.matlet.2024.136570
UR - https://linkinghub.elsevier.com/retrieve/pii/S0167577X24007080
TI - Selective nitride passivation using vapor-dosed aldehyde inhibitors for area-selective atomic layer deposition
T2 - Materials Letters
AU - Park, Haneul
AU - Oh, Jieun
AU - Lee, Jeong Min
AU - Kim, Woo-Hee
PY - 2024
DA - 2024/07/01
PB - Elsevier
SP - 136570
VL - 366
SN - 0167-577X
SN - 1873-4979
ER -
Cite this
BibTex (up to 50 authors)
Copy
@article{2024_Park,
author = {Haneul Park and Jieun Oh and Jeong Min Lee and Woo-Hee Kim},
title = {Selective nitride passivation using vapor-dosed aldehyde inhibitors for area-selective atomic layer deposition},
journal = {Materials Letters},
year = {2024},
volume = {366},
publisher = {Elsevier},
month = {jul},
url = {https://linkinghub.elsevier.com/retrieve/pii/S0167577X24007080},
pages = {136570},
doi = {10.1016/j.matlet.2024.136570}
}