volume 192 pages 109463

Defect evolution in gallium oxide during stretching process: A molecular dynamics simulation

Publication typeJournal Article
Publication date2025-06-01
scimago Q1
wos Q2
SJR0.785
CiteScore8.4
Impact factor4.6
ISSN13698001, 18734081
Abstract
Gallium oxide (Ga2O3) is a new generation ultra-wide bandgap semiconductor material with excellent properties such as high electron mobility, high-voltage electrical response speed, and radiation resistance. However, few reports currently exist on the nanomechanical properties of Ga2O3. In this study, a potential function of Ga2O3 can be used to describe α-, β- and ε-phases was developed through machine learning approach. Based on the developed potential function, the mechanical properties and defect evolution of Ga2O3 under different crystal structures, defects, and temperatures were thoroughly studied. The results indicate that the mechanical properties of Ga2O3 with different crystal phases exhibit significant anisotropy. Among them, the α phase Ga2O3 endures the largest deformation force, and the β phase undergoes the highest deformation. Upon loading α-Ga2O3, the slip phase transition occurs, whereas, for the β- and ε-Ga2O3, the amorphous phase transition occurs directly along the fracture interface without slip phase transition. Ga2O3 exhibits typical brittle fracture during tensile fracture. The adhesion degree of atoms at the fracture interface increases with the rise of temperature. The existence of defects in Ga2O3 changes the direction of phase transformation slip during the tensile fracture. The increased temperature leads to an increase in the proportion of amorphous phase transformation of Ga2O3 during stretching, but the proportion of bond breakage shows an overall downward trend.
Found 
Found 

Are you a researcher?

Create a profile to get free access to personal recommendations for colleagues and new articles.
Metrics
1
Share
Cite this
GOST |
Cite this
GOST Copy
Li R. et al. Defect evolution in gallium oxide during stretching process: A molecular dynamics simulation // Materials Science in Semiconductor Processing. 2025. Vol. 192. p. 109463.
GOST all authors (up to 50) Copy
Li R., Qi Z., Sun Z., Meng B., Shen W., Zhang Z., Wu G. Defect evolution in gallium oxide during stretching process: A molecular dynamics simulation // Materials Science in Semiconductor Processing. 2025. Vol. 192. p. 109463.
RIS |
Cite this
RIS Copy
TY - JOUR
DO - 10.1016/j.mssp.2025.109463
UR - https://linkinghub.elsevier.com/retrieve/pii/S1369800125002008
TI - Defect evolution in gallium oxide during stretching process: A molecular dynamics simulation
T2 - Materials Science in Semiconductor Processing
AU - Li, Rui
AU - Qi, Zijun
AU - Sun, Zhanpeng
AU - Meng, Biao
AU - Shen, Wei
AU - Zhang, Zhaofu
AU - Wu, Gai
PY - 2025
DA - 2025/06/01
PB - Elsevier
SP - 109463
VL - 192
SN - 1369-8001
SN - 1873-4081
ER -
BibTex
Cite this
BibTex (up to 50 authors) Copy
@article{2025_Li,
author = {Rui Li and Zijun Qi and Zhanpeng Sun and Biao Meng and Wei Shen and Zhaofu Zhang and Gai Wu},
title = {Defect evolution in gallium oxide during stretching process: A molecular dynamics simulation},
journal = {Materials Science in Semiconductor Processing},
year = {2025},
volume = {192},
publisher = {Elsevier},
month = {jun},
url = {https://linkinghub.elsevier.com/retrieve/pii/S1369800125002008},
pages = {109463},
doi = {10.1016/j.mssp.2025.109463}
}
Profiles