Concept of atomic layer deposition application in electrochromic device fabrication approved on ITO@NiO whisker layers

The paper discusses potential prospects for using atomic layer deposition (ALD) in the development of electrochromic devices. Today, there are established concepts for optimizing the properties of electrochromic materials by creating highly porous systems, particularly core-shell composite systems. ALD can also be used to deposit solid-state electrolytes and other smart window materials onto porous substrates. The paper suggests hypothetical examples of designing all-solid-state electrochromic devices with the potential for high-performance parameters. The experimental section of the study proposes a novel hierarchical structure for electrochromic materials of anodic colouring. This structure consists of electron-beam deposited ITO whiskers coated with a thin X-ray amorphous 20 nm ALD NiO coating. The electrochromic tests of two obtained composite structures are presented. The best sample demonstrated an optical modulation capability of no less than 66 % (at 550 nm) and a stable electrochromic effect for more than 1000 polarization cycles.