, volume 9 , issue 3 , pages 271-304

Metal-assisted chemical etching of silicon and nanotechnology applications

Hee Han ¹

Zhipeng Huang ²

Woo Lee ¹

Hide authors affiliations Show authors affiliations: 2 affiliations

Korea Research Institute of Standards and Science (KRISS), Yuseong, 305-340 Daejeon, Republic of Korea |

China-Australia Joint Research Center for Functional Molecular Materials, Scientific Research Academy, Jiangsu University, Zhenjiang 212013, PR China |

Publication type: Journal Article

Publication date: 2014-06-01

Elsevier

Nano Today

scimago Q1

wos Q1

SJR: 2.962

CiteScore: 19.6

Impact factor: 10.9

ISSN: 17480132, 1878044X

DOI: 10.1016/j.nantod.2014.04.013

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Pharmaceutical Science

Biotechnology

General Materials Science

Bioengineering

Biomedical Engineering

Abstract

Silicon nanostructures exhibit promising application potentials in many fields in comparison with their bulk counterpart or other semiconductor nanostructures. Therefore, the exploiting of controllable fabrication methods of silicon nanostructures, and the exploring of further applications of silicon nanostructures gain extensive attentions. In this review, recent advances in metal-assisted chemical etching of silicon, a low-cost and versatile method enabling fine control over morphology feature of silicon nanostructures, are summarized. The overview concerning the applications of silicon nanostructures in the field of energy conversion and storage, and sensors are also presented.

Found

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Gavrilov Sergey

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National Research University of Electronic Technology

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Bespalova Polina

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Peter the Great St. Petersburg Polytechnic University

St Petersburg National Research Academic University of the Russian Academy of Sciences

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PhD in Engineering

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National Research University of Electronic Technology

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Southwest Jiaotong University

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Koshtyal Yury

🤝

PhD in Chemistry

46 publications, 539 citations

h-index: 13

Ioffe Physical-Technical Institute of the Russian Academy of Sciences

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Lithium-ion batteries

Precursors of cathode materials

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1 citation

Shishkin Ivan

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Han H., Huang Z., Lee W. Metal-assisted chemical etching of silicon and nanotechnology applications // Nano Today. 2014. Vol. 9. No. 3. pp. 271-304.

GOST all authors (up to 50) Copy

Han H., Huang Z., Lee W. Metal-assisted chemical etching of silicon and nanotechnology applications // Nano Today. 2014. Vol. 9. No. 3. pp. 271-304.

RIS |

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RIS Copy

TY - JOUR

DO - 10.1016/j.nantod.2014.04.013

UR - https://doi.org/10.1016/j.nantod.2014.04.013

TI - Metal-assisted chemical etching of silicon and nanotechnology applications

T2 - Nano Today

AU - Han, Hee

AU - Huang, Zhipeng

AU - Lee, Woo

PY - 2014

DA - 2014/06/01

PB - Elsevier

SP - 271-304

IS - 3

VL - 9

SN - 1748-0132

SN - 1878-044X

ER -

BibTex |

Cite this

BibTex (up to 50 authors) Copy

@article{2014_Han,

author = {Hee Han and Zhipeng Huang and Woo Lee},

title = {Metal-assisted chemical etching of silicon and nanotechnology applications},

journal = {Nano Today},

year = {2014},

volume = {9},

publisher = {Elsevier},

month = {jun},

url = {https://doi.org/10.1016/j.nantod.2014.04.013},

number = {3},

pages = {271--304},

doi = {10.1016/j.nantod.2014.04.013}

}

MLA

Cite this

MLA Copy

Han, Hee, et al. “Metal-assisted chemical etching of silicon and nanotechnology applications.” Nano Today, vol. 9, no. 3, Jun. 2014, pp. 271-304. https://doi.org/10.1016/j.nantod.2014.04.013.

Publisher

Elsevier

Journal

Nano Today

scimago Q1

wos Q1

SJR

2.962

CiteScore

19.6

Impact factor

10.9

ISSN

17480132 (Print)

1878044X