Optics and Laser Technology, volume 155, pages 108411

Micron-scale crystallization of Bi:YIG by laser rapid thermal annealing at controlled atmosphere

Shelaev Artem ^{1, 2}

Sgibnev Yevgeniy ¹

Efremova Svetlana ^{1, 3}

Tananaev Petr ¹

Baryshev Alexander ¹

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Dukhov Automatics Research Institute (VNIIA), Moscow 127030, Russia |

Institute of Physics, Kazan Federal University, Kazan 420008, Russia |

Lomonosov Moscow State University, Moscow 119991, Russia |

Publication type: Journal Article

Publication date: 2022-11-01

Elsevier

Journal: Optics and Laser Technology

Quartile SCImago

Quartile WOS

Impact factor: 5

ISSN: 00303992

DOI: 10.1016/j.optlastec.2022.108411

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Electronic, Optical and Magnetic Materials

Atomic and Molecular Physics, and Optics

Electrical and Electronic Engineering

Abstract

• A method of local laser annealing for the crystallization of Bi:YIG from oxide films obtained by metal–organic decomposition has been developed. • Bi:YIG laser crystallization was carried out in dry air, O 2 , N 2 and Ar atmospheres . • By-products of crystallization after annealing in O 2 , N 2 and Ar in the form of metallic Bi and Fe oxides were identified by Raman spectroscopy . • The largest Faraday rotation was found to be 2.6 deg/µm (at 500 nm wavelength) for a Bi 0.5 :YIG garnet film annealed in air. Rapid thermal annealing (RTA) at 800–900 °C in air atmosphere is commonly used to crystallize bismuth-substituted yttrium iron garnet (Bi:YIG) deposited by vacuum evaporation techniques or metal–organic decomposition. However, the conventional RTA leads to undesirable effects in applications where Bi:YIG is the constituent material of a nano- or microstructure. Here we report on an approach to Bi:YIG local crystallization by a focused continuous wave laser beam ( L RTA). The structural and optical properties of micron-sized Bi:YIG stripes crystallized in air, oxygen, nitrogen and argon atmospheres are discussed. The demonstrated LRTA can find practical applications for Bi:YIG monolithic integration on non-garnet substrates.

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	1
Nanomaterials	Nanomaterials, 1, 25% Nanomaterials 1 publication, 25%
Applied Spectroscopy	Applied Spectroscopy, 1, 25% Applied Spectroscopy 1 publication, 25%
Ceramics International	Ceramics International, 1, 25% Ceramics International 1 publication, 25%
Optical Materials	Optical Materials, 1, 25% Optical Materials 1 publication, 25%
	1

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Elsevier	Elsevier, 2, 50% Elsevier 2 publications, 50%
Multidisciplinary Digital Publishing Institute (MDPI)	Multidisciplinary Digital Publishing Institute (MDPI), 1, 25% Multidisciplinary Digital Publishing Institute (MDPI) 1 publication, 25%
SAGE	SAGE, 1, 25% SAGE 1 publication, 25%
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Shelaev A. et al. Micron-scale crystallization of Bi:YIG by laser rapid thermal annealing at controlled atmosphere // Optics and Laser Technology. 2022. Vol. 155. p. 108411.

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Shelaev A., Sgibnev Y., Efremova S., Tananaev P., Baryshev A. Micron-scale crystallization of Bi:YIG by laser rapid thermal annealing at controlled atmosphere // Optics and Laser Technology. 2022. Vol. 155. p. 108411.

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TY - JOUR

DO - 10.1016/j.optlastec.2022.108411

UR - https://doi.org/10.1016%2Fj.optlastec.2022.108411

TI - Micron-scale crystallization of Bi:YIG by laser rapid thermal annealing at controlled atmosphere

T2 - Optics and Laser Technology

AU - Shelaev, Artem

AU - Sgibnev, Yevgeniy

AU - Efremova, Svetlana

AU - Tananaev, Petr

AU - Baryshev, Alexander

PY - 2022

DA - 2022/11/01 00:00:00

PB - Elsevier

SP - 108411

VL - 155

SN - 0030-3992

ER -

BibTex

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BibTex Copy

@article{2022_Shelaev,

author = {Artem Shelaev and Yevgeniy Sgibnev and Svetlana Efremova and Petr Tananaev and Alexander Baryshev},

title = {Micron-scale crystallization of Bi:YIG by laser rapid thermal annealing at controlled atmosphere},

journal = {Optics and Laser Technology},

year = {2022},

volume = {155},

publisher = {Elsevier},

month = {nov},

url = {https://doi.org/10.1016%2Fj.optlastec.2022.108411},

pages = {108411},

doi = {10.1016/j.optlastec.2022.108411}

}

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Publisher

Elsevier

Journal

Optics and Laser Technology

Quartile SCImago

Quartile WOS

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00303992 (Print)

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Optical Laboratory

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