volume 215 pages 108821

SOS Pseudo-FeFETs after Furnace or Rapid Annealings and Thining by Thermal Oxidation

Publication typeJournal Article
Publication date2024-05-01
scimago Q3
wos Q4
SJR0.352
CiteScore3.1
Impact factor1.4
ISSN00381101, 18792405
Materials Chemistry
Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Electrical and Electronic Engineering
Abstract
The silicon-on-sapphire (SOS) pseudo-MOSFETs with high-k buried hafnium dioxide interlayer (IL) were investigated after the hydrogen induced Si and HfO2 layer transfer on c-sapphire wafers and annealing at 600-1100 °C. HRTEM, GIXRD and Raman measurements were used to reveal the hafnia phases for furnace and rapid thermal annealings (FA and RTA).
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Antonov V. et al. SOS Pseudo-FeFETs after Furnace or Rapid Annealings and Thining by Thermal Oxidation // Solid-State Electronics. 2024. Vol. 215. p. 108821.
GOST all authors (up to 50) Copy
Antonov V., Tikhonenko F. V., Popov V. P., Miakonkikh A., Rudenko K. V., Sverdlov V. SOS Pseudo-FeFETs after Furnace or Rapid Annealings and Thining by Thermal Oxidation // Solid-State Electronics. 2024. Vol. 215. p. 108821.
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TY - JOUR
DO - 10.1016/j.sse.2023.108821
UR - https://linkinghub.elsevier.com/retrieve/pii/S0038110123002344
TI - SOS Pseudo-FeFETs after Furnace or Rapid Annealings and Thining by Thermal Oxidation
T2 - Solid-State Electronics
AU - Antonov, V.A.
AU - Tikhonenko, F V
AU - Popov, V P
AU - Miakonkikh, Andrey
AU - Rudenko, Konstantin V.
AU - Sverdlov, Viktor
PY - 2024
DA - 2024/05/01
PB - Elsevier
SP - 108821
VL - 215
SN - 0038-1101
SN - 1879-2405
ER -
BibTex
Cite this
BibTex (up to 50 authors) Copy
@article{2024_Antonov,
author = {V.A. Antonov and F V Tikhonenko and V P Popov and Andrey Miakonkikh and Konstantin V. Rudenko and Viktor Sverdlov},
title = {SOS Pseudo-FeFETs after Furnace or Rapid Annealings and Thining by Thermal Oxidation},
journal = {Solid-State Electronics},
year = {2024},
volume = {215},
publisher = {Elsevier},
month = {may},
url = {https://linkinghub.elsevier.com/retrieve/pii/S0038110123002344},
pages = {108821},
doi = {10.1016/j.sse.2023.108821}
}