Thin Solid Films, volume 684, pages 15-20
Characterization of highly textured piezoelectric AlN films obtained from aluminum and ammonium chloride by a simple vapor deposition process
Publication type: Journal Article
Publication date: 2019-08-01
Materials Chemistry
Metals and Alloys
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Abstract
We report a simple and efficient deposition technique for the growth of highly-textured AlN thin films. The proposed chloride-based chemical vapor deposition approach is based on widely available precursors and an unsophisticated experimental set-up. The films were characterized by electron microscopy, X-ray diffraction, Raman spectroscopy and cathodoluminescence. We studied the correlations between the deposition conditions and the properties of the resulting films, such as morphology, microstructure, features of the Raman spectra, and piezoelectric characteristics. In particular, we show that the minimum of the Raman bands A1(TO)/ E2(h) intensity ratio, under excitation along c-axis, corresponds to the maximum of the piezoelectric coefficient. The films deposited under the optimized conditions are composed of well-aligned column-like crystallites. These films have a piezoelectric coefficient of 5.5–6.5 pC/N, which approaches the highest values reported for this material. The simplicity, efficiency and high quality of the resulting films make the proposed deposition approach highly interesting for a wide range of practical applications.
Citations by journals
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2
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IEEE Sensors Journal
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IEEE Sensors Journal
2 publications, 28.57%
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Applied Surface Science
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Applied Surface Science
1 publication, 14.29%
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Nanomaterials
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Nanomaterials
1 publication, 14.29%
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Micro and Nano Letters
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Micro and Nano Letters
1 publication, 14.29%
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Chinese Physics B
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Chinese Physics B
1 publication, 14.29%
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2
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Citations by publishers
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1
2
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IEEE
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IEEE
2 publications, 28.57%
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Elsevier
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Elsevier
1 publication, 14.29%
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Multidisciplinary Digital Publishing Institute (MDPI)
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Multidisciplinary Digital Publishing Institute (MDPI)
1 publication, 14.29%
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Institution of Engineering and Technology (IET)
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Institution of Engineering and Technology (IET)
1 publication, 14.29%
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IOP Publishing
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IOP Publishing
1 publication, 14.29%
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2
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- We do not take into account publications that without a DOI.
- Statistics recalculated only for publications connected to researchers, organizations and labs registered on the platform.
- Statistics recalculated weekly.
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Red’kin A. A. et al. Characterization of highly textured piezoelectric AlN films obtained from aluminum and ammonium chloride by a simple vapor deposition process // Thin Solid Films. 2019. Vol. 684. pp. 15-20.
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Red’kin A. A., Yakimov E. E., Roshchupkin D., Korepanov V. I. Characterization of highly textured piezoelectric AlN films obtained from aluminum and ammonium chloride by a simple vapor deposition process // Thin Solid Films. 2019. Vol. 684. pp. 15-20.
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TY - JOUR
DO - 10.1016/j.tsf.2019.05.049
UR - https://doi.org/10.1016%2Fj.tsf.2019.05.049
TI - Characterization of highly textured piezoelectric AlN films obtained from aluminum and ammonium chloride by a simple vapor deposition process
T2 - Thin Solid Films
AU - Red’kin, A. A.
AU - Yakimov, E. E.
AU - Roshchupkin, Dmitry
AU - Korepanov, V I
PY - 2019
DA - 2019/08/01 00:00:00
PB - Elsevier
SP - 15-20
VL - 684
SN - 0040-6090
ER -
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@article{2019_Red’kin,
author = {A. A. Red’kin and E. E. Yakimov and Dmitry Roshchupkin and V I Korepanov},
title = {Characterization of highly textured piezoelectric AlN films obtained from aluminum and ammonium chloride by a simple vapor deposition process},
journal = {Thin Solid Films},
year = {2019},
volume = {684},
publisher = {Elsevier},
month = {aug},
url = {https://doi.org/10.1016%2Fj.tsf.2019.05.049},
pages = {15--20},
doi = {10.1016/j.tsf.2019.05.049}
}
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