Vacuum, volume 231, pages 113767

SiO2 sputtering by low-energy Ar+, Kr+, and Xe+ ions in plasma conditions

D V Lopaev
M R Konnikova
A T Rakhimov
Publication typeJournal Article
Publication date2025-01-01
Journal: Vacuum
scimago Q1
SJR0.705
CiteScore6.8
Impact factor3.8
ISSN0042207X, 18792715
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