Design of very transparent fluoropolymer resists for semiconductor manufacture at 157 nm
Тип публикации: Journal Article
Дата публикации: 2003-07-01
SCImago Q3
WOS Q3
БС2
SJR: 0.349
CiteScore: 3.1
Impact factor: 1.6
ISSN: 00221139, 18733328
Organic Chemistry
Biochemistry
Inorganic Chemistry
Physical and Theoretical Chemistry
Environmental Chemistry
Краткое описание
Photolithography at 157 nm requires development of new photoresists that are highly transparent at this wavelength. Transparent fluoropolymer platforms have been identified which also possess other materials properties required for chemically amplified imaging and aqueous development. Polymers of tetrafluoroethylene (TFE), a fluoroalcohol-substituted norbornene and an acid-labile acrylate ester show the best combination of properties. A solution, semibatch, free-radical polymerization process was developed allowing synthesis of the terpolymers on a multikilogram scale. Further property enhancements may arise from replacing the norbornene with functionalized tricyclononenes. Formulated resists have been imaged in a 157 nm microstepper.
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ГОСТ
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Feiring A. et al. Design of very transparent fluoropolymer resists for semiconductor manufacture at 157 nm // Journal of Fluorine Chemistry. 2003. Vol. 122. No. 1. pp. 11-16.
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Feiring A., Crawford M. H., Farnham W., Feldman J., French R. D., Leffew K., Petrov V. A., Schadt F., Wheland R., Zumsteg F. C. Design of very transparent fluoropolymer resists for semiconductor manufacture at 157 nm // Journal of Fluorine Chemistry. 2003. Vol. 122. No. 1. pp. 11-16.
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TY - JOUR
DO - 10.1016/s0022-1139(03)00075-7
UR - https://doi.org/10.1016/s0022-1139(03)00075-7
TI - Design of very transparent fluoropolymer resists for semiconductor manufacture at 157 nm
T2 - Journal of Fluorine Chemistry
AU - Feiring, A.E.
AU - Crawford, M. H.
AU - Farnham, W.B.
AU - Feldman, J
AU - French, Richard D.
AU - Leffew, K.W.
AU - Petrov, V. A.
AU - Schadt, F.L.
AU - Wheland, R.C.
AU - Zumsteg, F. C.
PY - 2003
DA - 2003/07/01
PB - Elsevier
SP - 11-16
IS - 1
VL - 122
SN - 0022-1139
SN - 1873-3328
ER -
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BibTex (до 50 авторов)
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@article{2003_Feiring,
author = {A.E. Feiring and M. H. Crawford and W.B. Farnham and J Feldman and Richard D. French and K.W. Leffew and V. A. Petrov and F.L. Schadt and R.C. Wheland and F. C. Zumsteg},
title = {Design of very transparent fluoropolymer resists for semiconductor manufacture at 157 nm},
journal = {Journal of Fluorine Chemistry},
year = {2003},
volume = {122},
publisher = {Elsevier},
month = {jul},
url = {https://doi.org/10.1016/s0022-1139(03)00075-7},
number = {1},
pages = {11--16},
doi = {10.1016/s0022-1139(03)00075-7}
}
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MLA
Скопировать
Feiring, A.E., et al. “Design of very transparent fluoropolymer resists for semiconductor manufacture at 157 nm.” Journal of Fluorine Chemistry, vol. 122, no. 1, Jul. 2003, pp. 11-16. https://doi.org/10.1016/s0022-1139(03)00075-7.
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