Ceramics International, volume 43, issue 11, pages 8517-8524

Improving electrical conductivity and wear resistance of hafnium nitride films via tantalum incorporation

Publication typeJournal Article
Publication date2017-08-01
Quartile SCImago
Q1
Quartile WOS
Q1
Impact factor5.2
ISSN02728842
Materials Chemistry
Surfaces, Coatings and Films
Ceramics and Composites
Electronic, Optical and Magnetic Materials
Process Chemistry and Technology
Abstract
Transition metal nitrides are being widely applied, as durable sensors, semiconductor and superconductor devices, their electrical conductivity and wear resistance having a significant influence on these applications. However, there are few reports about how to improve above properties. In this paper, tantalum was incorporated into hafnium nitride films through Hf1-xTaxNy [x=Ta/(Hf+Ta), y=N/(Hf+Ta)] solid solution. The electrical conductivity and wear resistance of the films were significantly improved, due to the increase of the electron concentration (tantalum has one more valence electron than hafnium) and the increase in H/E and H3/E2 ratios caused by the effect of solid solution hardening, respectively. The highest electrical conductivity of Hf1-xTaxNy films is 8.3×105 S m−1, which is 1.7 times and 5.2 times of that of hafnium nitride and tantalum nitride films, respectively. In addition, the lowest wear rate of films is 1.2×10−6 mm3/N m, which is only 10% and 48% of that of hafnium nitride and tantalum nitride films, respectively. These results indicate that alloying with another transition metal is an effective method to improve electrical conductivity and wear resistance of transition metal nitrides.

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GOST |
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Gao J. et al. Improving electrical conductivity and wear resistance of hafnium nitride films via tantalum incorporation // Ceramics International. 2017. Vol. 43. No. 11. pp. 8517-8524.
GOST all authors (up to 50) Copy
Gao J., Zhao Y., Gu Z., Zhang S., Wen M., Wu L., Zheng W., Hu C. Improving electrical conductivity and wear resistance of hafnium nitride films via tantalum incorporation // Ceramics International. 2017. Vol. 43. No. 11. pp. 8517-8524.
RIS |
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RIS Copy
TY - JOUR
DO - 10.1016/j.ceramint.2017.04.003
UR - https://doi.org/10.1016/j.ceramint.2017.04.003
TI - Improving electrical conductivity and wear resistance of hafnium nitride films via tantalum incorporation
T2 - Ceramics International
AU - Gao, Jing
AU - Zhao, Yue
AU - Gu, Zhiqing
AU - Zhang, Sam
AU - Wen, Mao
AU - Wu, Lulu
AU - Zheng, Weitao
AU - Hu, Chaoquan
PY - 2017
DA - 2017/08/01 00:00:00
PB - Elsevier
SP - 8517-8524
IS - 11
VL - 43
SN - 0272-8842
ER -
BibTex |
Cite this
BibTex Copy
@article{2017_Gao,
author = {Jing Gao and Yue Zhao and Zhiqing Gu and Sam Zhang and Mao Wen and Lulu Wu and Weitao Zheng and Chaoquan Hu},
title = {Improving electrical conductivity and wear resistance of hafnium nitride films via tantalum incorporation},
journal = {Ceramics International},
year = {2017},
volume = {43},
publisher = {Elsevier},
month = {aug},
url = {https://doi.org/10.1016/j.ceramint.2017.04.003},
number = {11},
pages = {8517--8524},
doi = {10.1016/j.ceramint.2017.04.003}
}
MLA
Cite this
MLA Copy
Gao, Jing, et al. “Improving electrical conductivity and wear resistance of hafnium nitride films via tantalum incorporation.” Ceramics International, vol. 43, no. 11, Aug. 2017, pp. 8517-8524. https://doi.org/10.1016/j.ceramint.2017.04.003.
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