Characterization of Si-DLC films synthesized by low cost plasmaenhanced chemical vapor deposition
Igor A Salimon
1, 2
,
Dmitry Kiselev
3
,
Tatyana S Ilina
3
,
Roman N Zhukov
3
,
Aleksandr A Temirov
3
,
Ilya V Kubasov
3
,
E. A. Skryleva
3
,
A. V. Turutin
3
,
Publication type: Journal Article
Publication date: 2020-07-30
General Medicine
Abstract
Diamond-like carbon (DLC) coatings offer versatile applications in surface engineering due to high hardness and strength, chemical and radiation resistance, biocompatibility and low friction coefficient. When doped with Si, such coatings demonstrate even more beneficial properties, such as lower friction coefficient and higher thermal stability. We demonstrate the instrumental developments of a plasma-enhanced chemical vapor deposition (PECVD) method and the use of an original low-cost set-up aimed to synthesize Si-doped DLC films using polyphenylmethylsiloxane (PFMS) precursors. These films on the surface of glass substrate were characterized by means of XPS, AFM, Raman spectroscopy, and nanoindentation. Dry fiction coefficient was found to be reduced for Si-doped DLC for 4–6 times in comparison with glass substrate.
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Salimon I. A. et al. Characterization of Si-DLC films synthesized by low cost plasmaenhanced chemical vapor deposition // Materials Today: Proceedings. 2020. Vol. 33. pp. 1997-2002.
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Salimon I. A., Kiselev D., Ilina T. S., Zhukov R. N., Malinkovich M. D., Parkhomenko Y. N., Temirov A. A., Kubasov I. V., Skryleva E. A., Kislyuk A. M., Turutin A. V., Statnik E. S. Characterization of Si-DLC films synthesized by low cost plasmaenhanced chemical vapor deposition // Materials Today: Proceedings. 2020. Vol. 33. pp. 1997-2002.
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TY - JOUR
DO - 10.1016/j.matpr.2020.06.379
UR - https://doi.org/10.1016/j.matpr.2020.06.379
TI - Characterization of Si-DLC films synthesized by low cost plasmaenhanced chemical vapor deposition
T2 - Materials Today: Proceedings
AU - Salimon, Igor A
AU - Kiselev, Dmitry
AU - Ilina, Tatyana S
AU - Zhukov, Roman N
AU - Malinkovich, Mikhail D
AU - Parkhomenko, Yu. N.
AU - Temirov, Aleksandr A
AU - Kubasov, Ilya V
AU - Skryleva, E. A.
AU - Kislyuk, Alexander M
AU - Turutin, A. V.
AU - Statnik, Eugene S.
PY - 2020
DA - 2020/07/30
PB - Elsevier
SP - 1997-2002
VL - 33
SN - 2214-7853
ER -
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@article{2020_Salimon,
author = {Igor A Salimon and Dmitry Kiselev and Tatyana S Ilina and Roman N Zhukov and Mikhail D Malinkovich and Yu. N. Parkhomenko and Aleksandr A Temirov and Ilya V Kubasov and E. A. Skryleva and Alexander M Kislyuk and A. V. Turutin and Eugene S. Statnik},
title = {Characterization of Si-DLC films synthesized by low cost plasmaenhanced chemical vapor deposition},
journal = {Materials Today: Proceedings},
year = {2020},
volume = {33},
publisher = {Elsevier},
month = {jul},
url = {https://doi.org/10.1016/j.matpr.2020.06.379},
pages = {1997--2002},
doi = {10.1016/j.matpr.2020.06.379}
}