Materials Today, volume 67, pages 299-319

Trends in photoresist materials for extreme ultraviolet lithography: A review

Xiaolin Wang ¹

Peipei Tao ¹

Qianqian Wang ¹

Zhenzhou Shao ¹

Tianqi Liu ¹

Yang Hu ¹

Ziyu Hu ¹

Yimeng Wang ¹

Jianlong Wang ¹

Yuzhou Tang ¹

Hong Xu ¹

Xiangming He ¹

Hide authors affiliations Show authors affiliations: 1 affiliation

Institute of Nuclear and New Energy Technology, Tsinghua University, Beijing 100084, China |

Publication type: Journal Article

Publication date: 2023-07-01

Elsevier

Journal: Materials Today

Quartile SCImago

Quartile WOS

Impact factor: 24.2

ISSN: 13697021

DOI: 10.1016/j.mattod.2023.05.027

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Condensed Matter Physics

General Materials Science

Mechanical Engineering

Mechanics of Materials

Abstract

With the development of microelectronics, the demand for continuously miniaturized feature sizes has driven continuous progress in lithography technology. Extreme ultraviolet (EUV) lithography can directly pattern sub-20-nm half-pitch resolution, and it has emerged as the most promising nanoscale fabrication technology. However, the restricted brightness of the EUV light source and the limited reflectivity of multilayer mirrors impose new requirements for the sensitivity of photoresists. Furthermore, the high-resolution patterning characteristics of the EUV require resistive materials featuring smaller component sizes and higher etch resistance. Thus, the development of photoresists with new attributes of EUV remains a challenge. This review covers the evolution of EUV photoresists, including chemically amplified resists, non-chemically amplified polymer resists, molecular glass resists, and metal-containing resists, including the future development trends of EUV-sensitive materials.

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Polymers	Polymers, 2, 6.45% Polymers 2 publications, 6.45%
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Nanoscale	Nanoscale, 1, 3.23% Nanoscale 1 publication, 3.23%
Journal of Physical Chemistry C	Journal of Physical Chemistry C, 1, 3.23% Journal of Physical Chemistry C 1 publication, 3.23%
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Micromachines	Micromachines, 1, 3.23% Micromachines 1 publication, 3.23%
European Polymer Journal	European Polymer Journal, 1, 3.23% European Polymer Journal 1 publication, 3.23%
Small	Small, 1, 3.23% Small 1 publication, 3.23%
Nanotechnology	Nanotechnology, 1, 3.23% Nanotechnology 1 publication, 3.23%
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Applied Optics	Applied Optics, 1, 3.23% Applied Optics 1 publication, 3.23%
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes	Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes, 1, 3.23% Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes 1 publication, 3.23%
Advances in Colloid and Interface Science	Advances in Colloid and Interface Science, 1, 3.23% Advances in Colloid and Interface Science 1 publication, 3.23%
Nanomaterials	Nanomaterials, 1, 3.23% Nanomaterials 1 publication, 3.23%
Chinese Journal of Lasers	Chinese Journal of Lasers, 1, 3.23% Chinese Journal of Lasers 1 publication, 3.23%
ACS Nano	ACS Nano, 1, 3.23% ACS Nano 1 publication, 3.23%
ACS Macro Letters	ACS Macro Letters, 1, 3.23% ACS Macro Letters 1 publication, 3.23%
Scientific Reports	Scientific Reports, 1, 3.23% Scientific Reports 1 publication, 3.23%
Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics	Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics, 1, 3.23% Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics 1 publication, 3.23%
Coatings	Coatings, 1, 3.23% Coatings 1 publication, 3.23%
ACS Omega	ACS Omega, 1, 3.23% ACS Omega 1 publication, 3.23%
Science China Materials	Science China Materials, 1, 3.23% Science China Materials 1 publication, 3.23%
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Macromolecules	Macromolecules, 1, 3.23% Macromolecules 1 publication, 3.23%
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Citations by publishers

	1 2 3 4 5 6 7
Elsevier	Elsevier, 7, 22.58% Elsevier 7 publications, 22.58%
American Chemical Society (ACS)	American Chemical Society (ACS), 7, 22.58% American Chemical Society (ACS) 7 publications, 22.58%
Multidisciplinary Digital Publishing Institute (MDPI)	Multidisciplinary Digital Publishing Institute (MDPI), 5, 16.13% Multidisciplinary Digital Publishing Institute (MDPI) 5 publications, 16.13%
Royal Society of Chemistry (RSC)	Royal Society of Chemistry (RSC), 2, 6.45% Royal Society of Chemistry (RSC) 2 publications, 6.45%
IOP Publishing	IOP Publishing, 2, 6.45% IOP Publishing 2 publications, 6.45%
Springer Nature	Springer Nature, 2, 6.45% Springer Nature 2 publications, 6.45%
Thieme	Thieme, 1, 3.23% Thieme 1 publication, 3.23%
Wiley	Wiley, 1, 3.23% Wiley 1 publication, 3.23%
Optical Society of America	Optical Society of America, 1, 3.23% Optical Society of America 1 publication, 3.23%
Chinese Laser Press	Chinese Laser Press, 1, 3.23% Chinese Laser Press 1 publication, 3.23%
SPIE	SPIE, 1, 3.23% SPIE 1 publication, 3.23%
American Vacuum Society	American Vacuum Society, 1, 3.23% American Vacuum Society 1 publication, 3.23%
	1 2 3 4 5 6 7

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Wang X. et al. Trends in photoresist materials for extreme ultraviolet lithography: A review // Materials Today. 2023. Vol. 67. pp. 299-319.

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Wang X., Tao P., Wang Q., Shao Z., Liu T., Hu Y., Hu Z., Wang Y., Wang J., Tang Y., Xu H., He X. Trends in photoresist materials for extreme ultraviolet lithography: A review // Materials Today. 2023. Vol. 67. pp. 299-319.

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RIS Copy

TY - JOUR

DO - 10.1016/j.mattod.2023.05.027

UR - https://doi.org/10.1016/j.mattod.2023.05.027

TI - Trends in photoresist materials for extreme ultraviolet lithography: A review

T2 - Materials Today

AU - Wang, Xiaolin

AU - Tao, Peipei

AU - Wang, Qianqian

AU - Shao, Zhenzhou

AU - Liu, Tianqi

AU - Hu, Yang

AU - Hu, Ziyu

AU - Wang, Yimeng

AU - Wang, Jianlong

AU - Tang, Yuzhou

AU - Xu, Hong

AU - He, Xiangming

PY - 2023

DA - 2023/07/01 00:00:00

PB - Elsevier

SP - 299-319

VL - 67

SN - 1369-7021

ER -

BibTex

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BibTex Copy

@article{2023_Wang,

author = {Xiaolin Wang and Peipei Tao and Qianqian Wang and Zhenzhou Shao and Tianqi Liu and Yang Hu and Ziyu Hu and Yimeng Wang and Jianlong Wang and Yuzhou Tang and Hong Xu and Xiangming He},

title = {Trends in photoresist materials for extreme ultraviolet lithography: A review},

journal = {Materials Today},

year = {2023},

volume = {67},

publisher = {Elsevier},

month = {jul},

url = {https://doi.org/10.1016/j.mattod.2023.05.027},

pages = {299--319},

doi = {10.1016/j.mattod.2023.05.027}

}

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Elsevier

Journal

Materials Today

Quartile SCImago

Quartile WOS

Impact factor

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13697021 (Print)

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He, Xiangming M