Thin Solid Films

, том 515 , издание 13 , страницы 5298-5307

Chemical vapor deposition of amorphous ruthenium–phosphorus alloy films

Тип публикации: Journal Article

Дата публикации: 2007-05-01

Elsevier

Thin Solid Films

SCImago Q2

WOS Q3

БС1

SJR: 0.408

CiteScore: 4.3

Impact factor: 2.4

ISSN: 00406090, 18792731

DOI: 10.1016/j.tsf.2007.01.002

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Materials Chemistry

Metals and Alloys

Surfaces, Coatings and Films

Electronic, Optical and Magnetic Materials

Surfaces and Interfaces

Краткое описание

Chemical vapor deposition growth of amorphous ruthenium–phosphorus films on SiO 2 containing ∼ 15% phosphorus is reported. cis -Ruthenium(II)dihydridotetrakis-(trimethylphosphine), cis -RuH 2 (PMe 3 ) 4 (Me = CH 3 ) was used at growth temperatures ranging from 525 to 575 K. Both Ru and P are zero-valent. The films are metastable, becoming increasingly more polycrystalline upon annealing to 775 and 975 K. Surface studies illustrate that demethylation is quite efficient near 560 K. Precursor adsorption at 135 K or 210 K and heating reveal the precursor undergoes a complex decomposition process in which the hydride and trimethylphosphine ligands are lost at temperatures as low at 280 K. Phosphorus and its manner of incorporation appear responsible for the amorphous-like character. Molecular dynamics simulations are presented to suggest the local structure in the films and the causes for phosphorus stabilizing the amorphous phase.

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ГОСТ |

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Shin J. et al. Chemical vapor deposition of amorphous ruthenium–phosphorus alloy films // Thin Solid Films. 2007. Vol. 515. No. 13. pp. 5298-5307.

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Shin J., Waheed A., Winkenwerder W., Kim H., Agapiou K., Jones R. W., Hwang G. S., Ekerdt J. G. Chemical vapor deposition of amorphous ruthenium–phosphorus alloy films // Thin Solid Films. 2007. Vol. 515. No. 13. pp. 5298-5307.

RIS |

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TY - JOUR

DO - 10.1016/j.tsf.2007.01.002

UR - https://doi.org/10.1016/j.tsf.2007.01.002

TI - Chemical vapor deposition of amorphous ruthenium–phosphorus alloy films

T2 - Thin Solid Films

AU - Shin, Jin-Hong

AU - Waheed, Abdul

AU - Winkenwerder, Wyatt

AU - Kim, Hyunwoo

AU - Agapiou, Kyriacos

AU - Jones, Richard W.

AU - Hwang, Gyeong S.

AU - Ekerdt, John G.

PY - 2007

DA - 2007/05/01

PB - Elsevier

SP - 5298-5307

IS - 13

VL - 515

SN - 0040-6090

SN - 1879-2731

ER -

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@article{2007_Shin,

author = {Jin-Hong Shin and Abdul Waheed and Wyatt Winkenwerder and Hyunwoo Kim and Kyriacos Agapiou and Richard W. Jones and Gyeong S. Hwang and John G. Ekerdt},

title = {Chemical vapor deposition of amorphous ruthenium–phosphorus alloy films},

journal = {Thin Solid Films},

year = {2007},

volume = {515},

publisher = {Elsevier},

month = {may},

url = {https://doi.org/10.1016/j.tsf.2007.01.002},

number = {13},

pages = {5298--5307},

doi = {10.1016/j.tsf.2007.01.002}

}

MLA

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MLA Скопировать

Shin, Jin-Hong, et al. “Chemical vapor deposition of amorphous ruthenium–phosphorus alloy films.” Thin Solid Films, vol. 515, no. 13, May. 2007, pp. 5298-5307. https://doi.org/10.1016/j.tsf.2007.01.002.

Издатель

Elsevier

Журнал

Thin Solid Films

SCImago Q2

WOS Q3

БС1

SJR

0.408

CiteScore

4.3

Impact factor

2.4

ISSN

00406090 (Print, Electronic)

18792731

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