Development of a Deep Ultraviolet Positive-Tone Photoresist from the Sustainable Building Block Cyrene
Yizhou Liu
1, 2, 3, 4, 5
,
Josua Markus
5, 6
,
Han-Hao Cheng
5, 7
,
Paul V. Bernhardt
1, 2, 3, 4, 5
,
A. C. Whittaker
3, 5, 6, 8, 9, 10, 11, 12
,
Idriss Blakey
3, 5, 6, 8, 10, 13, 14, 15
,
Craig Williams
1, 2, 3, 4, 5
2
School of Chemistry and Molecular Biosciences
4
School of Chemistry and Molecular Biosciences, Brisbane, Australia
|
6
Australian Institute for Bioengineering and Nanotechnology, Brisbane, Australia
|
7
Centre for Microscopy and Microanalysis, Brisbane, Australia
|
9
10
Australian Institute for Bioengineering and Nanotechnology
13
14
Centre for Advanced Imaging
15
Centre for Advanced Imaging, Brisbane, Australia
|
Publication type: Journal Article
Publication date: 2025-01-28
scimago Q1
wos Q1
SJR: 2.065
CiteScore: 12.0
Impact factor: 7.0
ISSN: 08974756, 15205002
Abstract
The advancements in micro- and nanofabrication of semiconductor devices have led to a growing demand for innovative molecules to enhance photolithographic imaging materials. However, intensified production demands placed on deep ultraviolet (DUV) positive-tone chemically amplified resists, especially those based on polymethacrylates with alicyclic pendant groups, face increasing environmental challenges (e.g., nonsustainable monomer feedstocks). Disclosed herein is the synthesis of a series of methacrylic monomers and homopolymers derived from derivatives of the sustainable chemical building block dihydrolevoglucosenone (Cyrene, DLGO), obtained from renewable cellulose feedstocks. Poly(n-BuMDLGO) showed photoacid lability that modified the solubility upon treatment with basic developing solutions. This feature enabled photopatterning using both DUV (contact mask) and electron beam lithography.
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Liu Y. et al. Development of a Deep Ultraviolet Positive-Tone Photoresist from the Sustainable Building Block Cyrene // Chemistry of Materials. 2025. Vol. 37. No. 3. pp. 1060-1068.
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Liu Y., Markus J., Cheng H., Bernhardt P. V., Whittaker A. C., Blakey I., Williams C. Development of a Deep Ultraviolet Positive-Tone Photoresist from the Sustainable Building Block Cyrene // Chemistry of Materials. 2025. Vol. 37. No. 3. pp. 1060-1068.
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TY - JOUR
DO - 10.1021/acs.chemmater.4c02813
UR - https://pubs.acs.org/doi/10.1021/acs.chemmater.4c02813
TI - Development of a Deep Ultraviolet Positive-Tone Photoresist from the Sustainable Building Block Cyrene
T2 - Chemistry of Materials
AU - Liu, Yizhou
AU - Markus, Josua
AU - Cheng, Han-Hao
AU - Bernhardt, Paul V.
AU - Whittaker, A. C.
AU - Blakey, Idriss
AU - Williams, Craig
PY - 2025
DA - 2025/01/28
PB - American Chemical Society (ACS)
SP - 1060-1068
IS - 3
VL - 37
SN - 0897-4756
SN - 1520-5002
ER -
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BibTex (up to 50 authors)
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@article{2025_Liu,
author = {Yizhou Liu and Josua Markus and Han-Hao Cheng and Paul V. Bernhardt and A. C. Whittaker and Idriss Blakey and Craig Williams},
title = {Development of a Deep Ultraviolet Positive-Tone Photoresist from the Sustainable Building Block Cyrene},
journal = {Chemistry of Materials},
year = {2025},
volume = {37},
publisher = {American Chemical Society (ACS)},
month = {jan},
url = {https://pubs.acs.org/doi/10.1021/acs.chemmater.4c02813},
number = {3},
pages = {1060--1068},
doi = {10.1021/acs.chemmater.4c02813}
}
Cite this
MLA
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Liu, Yizhou, et al. “Development of a Deep Ultraviolet Positive-Tone Photoresist from the Sustainable Building Block Cyrene.” Chemistry of Materials, vol. 37, no. 3, Jan. 2025, pp. 1060-1068. https://pubs.acs.org/doi/10.1021/acs.chemmater.4c02813.
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