ACS Applied Electronic Materials, volume 6, issue 1, pages 406-414

HfO2-Based RRAM with In Situ Conductive Channels Induced by Nanoparticles to Improve Stability

Publication type: Journal Article
Publication date: 2023-12-27
scimago Q1
SJR: 1.058
CiteScore: 7.2
Impact factor: 4.3
ISSN: 26376113
Materials Chemistry
Electronic, Optical and Magnetic Materials
Electrochemistry
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