ACS applied materials & interfaces, volume 7, issue 22, pages 11713-11718

Enhancing the Reactivity of Al/CuO Nanolaminates by Cu Incorporation at the Interfaces

Lorena Marín 1, 2
Charith E Nanayakkara 3
Jean-Francois Veyan 3
Bénédicte Warot-Fonrose 2, 4
Sébastien Joulie 2, 4
Alain Esteve 1, 2
C. Tenailleau 2, 5
Carole Rossi 1, 2
Show full list: 9 authors
1
 
LAAS-CNRS, 7 Avenue du colonel Roche, F-31077 Toulouse, France
2
 
UPS, INSA, INP, ISAE, LAAS, Université de Toulouse, F-31062 Toulouse, France
4
 
CEMES-CNRS, 29, Rue Jeanne Marvig, F-31055 Toulouse, France
5
 
CIRIMAT-CNRS, 118 Route de Narbonne, F-31062 Toulouse Cedex 9, France
Publication typeJournal Article
Publication date2015-05-29
scimago Q1
SJR2.058
CiteScore16.0
Impact factor8.3
ISSN19448244, 19448252
General Materials Science
Abstract
In situ deposition of a thin (∼5 nm) layer of copper between Al and CuO layers is shown to increase the overall nanolaminate material reactivity. A combination of transmission electron microscopy imaging, in situ infrared spectroscopy, low energy ion scattering measurements, and first-principles calculations reveals that copper spontaneously diffuses into aluminum layers (substantially less in CuO layers). The formation of an interfacial Al:Cu alloy with melting temperature lower than pure Al metal is responsible for the enhanced reactivity, opening a route to controlling the stochiometry of the aluminum layer and increasing the reactivity of the nanoenergetic multilayer systems in general.
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