том 3 издание 2 страницы 769-777

Mid-IR-Sensitive n/p-Junction Fabricated on p-Type Si Surface via Ultrashort Pulse Laser n-Type Hyperdoping and High-Temperature Annealing

Alena Nastulyavichus 1
D.A. Kirilenko 2, 3
P.N Brunkov 2, 3
Andrey E. Rudenko 1
Nikolay Melnik 1
Roman Khmelnitskii 1
Victor Martovitskii 1
M.V. USPENSKAYA 2
D. D. Prikhodko 5, 6
S. A. Tarelkin 5, 7, 8
Artem Galkin 5
Taisia Drozdova 5
Тип публикацииJournal Article
Дата публикации2021-01-18
scimago Q1
wos Q2
БС1
SJR1.045
CiteScore7.4
Impact factor4.7
ISSN26376113
Materials Chemistry
Electronic, Optical and Magnetic Materials
Electrochemistry
Краткое описание
The mid-infrared (IR)-sensitive n/p-junction was fabricated on a p-doped silicon (Si) wafer via ultrashort laser n-type surface hyperdoping and high-temperature annealing. First, the n-type sulfur ...
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ГОСТ |
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Kudryashov S. et al. Mid-IR-Sensitive n/p-Junction Fabricated on p-Type Si Surface via Ultrashort Pulse Laser n-Type Hyperdoping and High-Temperature Annealing // ACS Applied Electronic Materials. 2021. Vol. 3. No. 2. pp. 769-777.
ГОСТ со всеми авторами (до 50) Скопировать
Kudryashov S., Nastulyavichus A., Kirilenko D., Brunkov P., Shakhmin A. L., Rudenko A. E., Melnik N., Khmelnitskii R., Martovitskii V., USPENSKAYA M., Prikhodko D. D., Tarelkin S. A., Galkin A., Drozdova T., Ionin A. Mid-IR-Sensitive n/p-Junction Fabricated on p-Type Si Surface via Ultrashort Pulse Laser n-Type Hyperdoping and High-Temperature Annealing // ACS Applied Electronic Materials. 2021. Vol. 3. No. 2. pp. 769-777.
RIS |
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TY - JOUR
DO - 10.1021/acsaelm.0c00914
UR - https://doi.org/10.1021/acsaelm.0c00914
TI - Mid-IR-Sensitive n/p-Junction Fabricated on p-Type Si Surface via Ultrashort Pulse Laser n-Type Hyperdoping and High-Temperature Annealing
T2 - ACS Applied Electronic Materials
AU - Kudryashov, Sergey
AU - Nastulyavichus, Alena
AU - Kirilenko, D.A.
AU - Brunkov, P.N
AU - Shakhmin, Alexander L
AU - Rudenko, Andrey E.
AU - Melnik, Nikolay
AU - Khmelnitskii, Roman
AU - Martovitskii, Victor
AU - USPENSKAYA, M.V.
AU - Prikhodko, D. D.
AU - Tarelkin, S. A.
AU - Galkin, Artem
AU - Drozdova, Taisia
AU - Ionin, Andrey
PY - 2021
DA - 2021/01/18
PB - American Chemical Society (ACS)
SP - 769-777
IS - 2
VL - 3
SN - 2637-6113
ER -
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@article{2021_Kudryashov,
author = {Sergey Kudryashov and Alena Nastulyavichus and D.A. Kirilenko and P.N Brunkov and Alexander L Shakhmin and Andrey E. Rudenko and Nikolay Melnik and Roman Khmelnitskii and Victor Martovitskii and M.V. USPENSKAYA and D. D. Prikhodko and S. A. Tarelkin and Artem Galkin and Taisia Drozdova and Andrey Ionin},
title = {Mid-IR-Sensitive n/p-Junction Fabricated on p-Type Si Surface via Ultrashort Pulse Laser n-Type Hyperdoping and High-Temperature Annealing},
journal = {ACS Applied Electronic Materials},
year = {2021},
volume = {3},
publisher = {American Chemical Society (ACS)},
month = {jan},
url = {https://doi.org/10.1021/acsaelm.0c00914},
number = {2},
pages = {769--777},
doi = {10.1021/acsaelm.0c00914}
}
MLA
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Kudryashov, Sergey, et al. “Mid-IR-Sensitive n/p-Junction Fabricated on p-Type Si Surface via Ultrashort Pulse Laser n-Type Hyperdoping and High-Temperature Annealing.” ACS Applied Electronic Materials, vol. 3, no. 2, Jan. 2021, pp. 769-777. https://doi.org/10.1021/acsaelm.0c00914.