Investigation of Dual-Ion Beam Sputter-Instigated Plasmon Generation in TCOs: A Case Study of GZO
Vivek Garg
1
,
Brajendra S Sengar
1
,
Vishnu Awasthi
1
,
Amitesh Kumar
1
,
Rohit Singh
1
,
Shailendra Kumar
2
,
C. Mukherjee
3, 4
,
V. V. Atuchin
5, 6, 7
,
Publication type: Journal Article
Publication date: 2018-02-05
scimago Q1
wos Q1
SJR: 1.921
CiteScore: 14.5
Impact factor: 8.2
ISSN: 19448244, 19448252
PubMed ID:
29356500
General Materials Science
Abstract
The use of the high free-electron concentration in heavily doped semiconductor enables the realization of plasmons. We report a novel approach to generate plasmons in Ga:ZnO (GZO) thin films in the wide spectral range of ∼1.87-10.04 eV. In the grown GZO thin films, dual-ion beam sputtering (DIBS) instigated plasmon is observed because of the formation of different metallic nanoclusters are reported. Moreover, formation of the nanoclusters and generation of plasmons are verified by field emission scanning electron microscope, electron energy loss spectra obtained by ultraviolet photoelectron spectroscopy, and spectroscopic ellipsometry analysis. Moreover, the calculation of valence bulk, valence surface, and particle plasmon resonance energies are performed, and indexing of each plasmon peaks with corresponding plasmon energy peak of the different nanoclusters is carried out. Further, the use of DIBS-instigated plasmon-enhanced GZO can be a novel mean to improve the performance of photovoltaic, photodetector, and sensing devices.
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Metrics
61
Total citations:
61
Citations from 2024:
10
(16.4%)
The most citing journal
Citations in journal:
6
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Garg V. et al. Investigation of Dual-Ion Beam Sputter-Instigated Plasmon Generation in TCOs: A Case Study of GZO // ACS applied materials & interfaces. 2018. Vol. 10. No. 6. pp. 5464-5474.
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Garg V., Sengar B. S., Awasthi V., Kumar A., Singh R., Kumar S., Mukherjee C., Atuchin V. V., Mukherjee S. Investigation of Dual-Ion Beam Sputter-Instigated Plasmon Generation in TCOs: A Case Study of GZO // ACS applied materials & interfaces. 2018. Vol. 10. No. 6. pp. 5464-5474.
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RIS
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TY - JOUR
DO - 10.1021/acsami.7b15103
UR - https://doi.org/10.1021/acsami.7b15103
TI - Investigation of Dual-Ion Beam Sputter-Instigated Plasmon Generation in TCOs: A Case Study of GZO
T2 - ACS applied materials & interfaces
AU - Garg, Vivek
AU - Sengar, Brajendra S
AU - Awasthi, Vishnu
AU - Kumar, Amitesh
AU - Singh, Rohit
AU - Kumar, Shailendra
AU - Mukherjee, C.
AU - Atuchin, V. V.
AU - Mukherjee, Shaibal
PY - 2018
DA - 2018/02/05
PB - American Chemical Society (ACS)
SP - 5464-5474
IS - 6
VL - 10
PMID - 29356500
SN - 1944-8244
SN - 1944-8252
ER -
Cite this
BibTex (up to 50 authors)
Copy
@article{2018_Garg,
author = {Vivek Garg and Brajendra S Sengar and Vishnu Awasthi and Amitesh Kumar and Rohit Singh and Shailendra Kumar and C. Mukherjee and V. V. Atuchin and Shaibal Mukherjee},
title = {Investigation of Dual-Ion Beam Sputter-Instigated Plasmon Generation in TCOs: A Case Study of GZO},
journal = {ACS applied materials & interfaces},
year = {2018},
volume = {10},
publisher = {American Chemical Society (ACS)},
month = {feb},
url = {https://doi.org/10.1021/acsami.7b15103},
number = {6},
pages = {5464--5474},
doi = {10.1021/acsami.7b15103}
}
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Garg, Vivek, et al. “Investigation of Dual-Ion Beam Sputter-Instigated Plasmon Generation in TCOs: A Case Study of GZO.” ACS applied materials & interfaces, vol. 10, no. 6, Feb. 2018, pp. 5464-5474. https://doi.org/10.1021/acsami.7b15103.