Strain Effect on Oxygen Evolution Reaction Activity of Epitaxial NdNiO3 Thin Films.
Тип публикации: Journal Article
Дата публикации: 2019-03-05
scimago Q1
wos Q1
БС1
SJR: 1.921
CiteScore: 14.5
Impact factor: 8.2
ISSN: 19448244, 19448252
PubMed ID:
30834739
General Materials Science
Краткое описание
Epitaxial strain can cause both lattice distortion and oxygen nonstoichiometry, effects that are strongly coupled at heterojunctions of complex nickelate oxides. Here we decouple these structural and chemical effects on the oxygen evolution reaction (OER) by using a set of coherently strained epitaxial NdNiO3 films. We show that within the regime where oxygen vacancies (VO) are negligible, compressive strain is favorable for the OER whereas tensile strain is unfavorable; the former induces orbital splitting, resulting in a higher occupancy in the d3 z2- r2 orbital and weaker Ni-O chemisorption. However, when the tensile strain is sufficiently large to promote VO formation, an increase in the OER is also observed. The partial reduction of Ni3+ to Ni2+ due to VO makes the eg occupancy slightly larger than unity, which is thought to account for the increased OER activity. Our work highlights that epitaxial-strain-induced lattice distortion and VO generation can be individually or collectively exploited to tune OER activity, which is important for the predictive synthesis of high-performance electrocatalysts.
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Wang L. et al. Strain Effect on Oxygen Evolution Reaction Activity of Epitaxial NdNiO3 Thin Films. // ACS applied materials & interfaces. 2019. Vol. 11. No. 13. pp. 12941-12947.
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Wang L., Stoerzinger K. A., Lei C., Yin X., Li Y., Tang C. S., Jia E., Abdelsamie A., You L., Guo R., Chen J., Rusydi A., Wang J. Strain Effect on Oxygen Evolution Reaction Activity of Epitaxial NdNiO3 Thin Films. // ACS applied materials & interfaces. 2019. Vol. 11. No. 13. pp. 12941-12947.
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TY - JOUR
DO - 10.1021/acsami.8b21301
UR - https://doi.org/10.1021/acsami.8b21301
TI - Strain Effect on Oxygen Evolution Reaction Activity of Epitaxial NdNiO3 Thin Films.
T2 - ACS applied materials & interfaces
AU - Wang, Lai-Sheng
AU - Stoerzinger, Kelsey A.
AU - Lei, Chang
AU - Yin, Xinmao
AU - Li, Yangyang
AU - Tang, Chi Sin
AU - Jia, Endong
AU - Abdelsamie, Amr
AU - You, Lu
AU - Guo, Rui
AU - Chen, Jingsheng
AU - Rusydi, A
AU - Wang, Junling
PY - 2019
DA - 2019/03/05
PB - American Chemical Society (ACS)
SP - 12941-12947
IS - 13
VL - 11
PMID - 30834739
SN - 1944-8244
SN - 1944-8252
ER -
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@article{2019_Wang,
author = {Lai-Sheng Wang and Kelsey A. Stoerzinger and Chang Lei and Xinmao Yin and Yangyang Li and Chi Sin Tang and Endong Jia and Amr Abdelsamie and Lu You and Rui Guo and Jingsheng Chen and A Rusydi and Junling Wang},
title = {Strain Effect on Oxygen Evolution Reaction Activity of Epitaxial NdNiO3 Thin Films.},
journal = {ACS applied materials & interfaces},
year = {2019},
volume = {11},
publisher = {American Chemical Society (ACS)},
month = {mar},
url = {https://doi.org/10.1021/acsami.8b21301},
number = {13},
pages = {12941--12947},
doi = {10.1021/acsami.8b21301}
}
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MLA
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Wang, Lai-Sheng, et al. “Strain Effect on Oxygen Evolution Reaction Activity of Epitaxial NdNiO3 Thin Films..” ACS applied materials & interfaces, vol. 11, no. 13, Mar. 2019, pp. 12941-12947. https://doi.org/10.1021/acsami.8b21301.
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