volume 5 issue 4 pages 1493-1498

Tuning of Plasmons in Transparent Conductive Oxides by Carrier Accumulation

Publication typeJournal Article
Publication date2018-02-14
scimago Q1
wos Q1
SJR1.992
CiteScore11.7
Impact factor6.7
ISSN23304022
Electronic, Optical and Magnetic Materials
Biotechnology
Atomic and Molecular Physics, and Optics
Electrical and Electronic Engineering
Abstract
A metal naturally displays dramatic changes in its optical properties near the plasma frequency where the permittivity changes from a negative to a positive value, and the material turns from highly reflective to transparent. For many applications, it is desirable to achieve such large optical changes by electrical gating. However, this is challenging given the high carrier density of most metals, which causes them to effectively screen externally applied electrical fields. Indium tin oxide (ITO) is a low-electron-density metal that does afford electric tuning of its permittivity in the infrared spectral range. Here, we experimentally show the tunability of the plasma frequency of an ITO thin film by changing its sheet carrier density via gating with an ionic liquid. By applying moderate gate bias values up to 1.4 V, the electron density increases in a thin (∼3 nm) accumulation layer at the surface of the 15-nm-thick ITO film. This results in notable blue shifts in the plasma frequency. These optical and ...
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GOST |
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GOST Copy
Liu X. et al. Tuning of Plasmons in Transparent Conductive Oxides by Carrier Accumulation // ACS Photonics. 2018. Vol. 5. No. 4. pp. 1493-1498.
GOST all authors (up to 50) Copy
Liu X., KANG J., Yuan H., Park J., Cui Y., Hwang H. E., Brongersma M. L. Tuning of Plasmons in Transparent Conductive Oxides by Carrier Accumulation // ACS Photonics. 2018. Vol. 5. No. 4. pp. 1493-1498.
RIS |
Cite this
RIS Copy
TY - JOUR
DO - 10.1021/acsphotonics.7b01517
UR - https://doi.org/10.1021/acsphotonics.7b01517
TI - Tuning of Plasmons in Transparent Conductive Oxides by Carrier Accumulation
T2 - ACS Photonics
AU - Liu, Xiao-Ge
AU - KANG, JU-HYUNG
AU - Yuan, Hongtao
AU - Park, Junghyun
AU - Cui, Yi
AU - Hwang, H E
AU - Brongersma, Mark L.
PY - 2018
DA - 2018/02/14
PB - American Chemical Society (ACS)
SP - 1493-1498
IS - 4
VL - 5
SN - 2330-4022
ER -
BibTex |
Cite this
BibTex (up to 50 authors) Copy
@article{2018_Liu,
author = {Xiao-Ge Liu and JU-HYUNG KANG and Hongtao Yuan and Junghyun Park and Yi Cui and H E Hwang and Mark L. Brongersma},
title = {Tuning of Plasmons in Transparent Conductive Oxides by Carrier Accumulation},
journal = {ACS Photonics},
year = {2018},
volume = {5},
publisher = {American Chemical Society (ACS)},
month = {feb},
url = {https://doi.org/10.1021/acsphotonics.7b01517},
number = {4},
pages = {1493--1498},
doi = {10.1021/acsphotonics.7b01517}
}
MLA
Cite this
MLA Copy
Liu, Xiao-Ge, et al. “Tuning of Plasmons in Transparent Conductive Oxides by Carrier Accumulation.” ACS Photonics, vol. 5, no. 4, Feb. 2018, pp. 1493-1498. https://doi.org/10.1021/acsphotonics.7b01517.