Nanoscale Horizons, volume 5, issue 5, pages 869-879

Metal assisted chemical etching of silicon in the gas phase: a nanofabrication platform for X-ray optics

L. Romano ^{1, 2, 3}

M. Kagias ¹

Joan Vila-Comamala ^{1, 2}

KONSTANTINS JEFIMOVS ^{1, 2}

Li-Ting Tseng ¹

V. A. Guzenko ¹

Marco Stampanoni ^{1, 2}

Show full list: 7 authors

Hide authors affiliations Show authors affiliations: 3 affiliations

Paul Scherrer Institut, 5232 Villigen PSI, Switzerland |

Institute for Biomedical Engineering, University and ETH Zürich, 8092 Zürich, Switzerland |

Department of Physics and CNR-IMM-University of Catania, 64 via S. Sofia, Catania, Italy

University of Catania

Institute for Microelectronics and Microsystems

Publication type: Journal Article

Publication date: 2020-02-17

Royal Society of Chemistry (RSC)

Journal: Nanoscale Horizons

scimago Q1

SJR: 2.089

CiteScore: 16.3

Impact factor: 8

ISSN: 20556756, 20556764

DOI: 10.1039/c9nh00709a

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PubMed ID: 32100775

General Materials Science

Abstract

Gas-MacEtch of Si with a Pt catalyst allows vertical etching nanostructures with an extreme aspect ratio up to 10 000 : 1.

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Metrics

CITATIONS

78 Total citations

41 Recent citations

8.74 Field Citation Ratio

2.61 Relative Citation Ratio

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GOST |

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GOST Copy

Romano L. et al. Metal assisted chemical etching of silicon in the gas phase: a nanofabrication platform for X-ray optics // Nanoscale Horizons. 2020. Vol. 5. No. 5. pp. 869-879.

GOST all authors (up to 50) Copy

Romano L., Kagias M., Vila-Comamala J., JEFIMOVS K., Tseng L., Guzenko V. A., Stampanoni M. Metal assisted chemical etching of silicon in the gas phase: a nanofabrication platform for X-ray optics // Nanoscale Horizons. 2020. Vol. 5. No. 5. pp. 869-879.

RIS |

Cite this

RIS Copy

TY - JOUR

DO - 10.1039/c9nh00709a

UR - https://doi.org/10.1039/c9nh00709a

TI - Metal assisted chemical etching of silicon in the gas phase: a nanofabrication platform for X-ray optics

T2 - Nanoscale Horizons

AU - Romano, L.

AU - Kagias, M.

AU - Vila-Comamala, Joan

AU - JEFIMOVS, KONSTANTINS

AU - Tseng, Li-Ting

AU - Guzenko, V. A.

AU - Stampanoni, Marco

PY - 2020

DA - 2020/02/17

PB - Royal Society of Chemistry (RSC)

SP - 869-879

IS - 5

VL - 5

PMID - 32100775

SN - 2055-6756

SN - 2055-6764

ER -

BibTex |

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BibTex (up to 50 authors) Copy

@article{2020_Romano,

author = {L. Romano and M. Kagias and Joan Vila-Comamala and KONSTANTINS JEFIMOVS and Li-Ting Tseng and V. A. Guzenko and Marco Stampanoni},

title = {Metal assisted chemical etching of silicon in the gas phase: a nanofabrication platform for X-ray optics},

journal = {Nanoscale Horizons},

year = {2020},

volume = {5},

publisher = {Royal Society of Chemistry (RSC)},

month = {feb},

url = {https://doi.org/10.1039/c9nh00709a},

number = {5},

pages = {869--879},

doi = {10.1039/c9nh00709a}

}

MLA

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MLA Copy

Romano, L., et al. “Metal assisted chemical etching of silicon in the gas phase: a nanofabrication platform for X-ray optics.” Nanoscale Horizons, vol. 5, no. 5, Feb. 2020, pp. 869-879. https://doi.org/10.1039/c9nh00709a.

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Publisher

Royal Society of Chemistry (RSC)

Journal

Nanoscale Horizons

scimago Q1

SJR

2.089

CiteScore

16.3

Impact factor

ISSN

20556756 (Print)

20556764 (Electronic)