Epitaxial growth of lithium niobate thin films from a single‐source organometallic precursor using metalorganic chemical vapor deposition
1
Corporate Research Laboratories, Eastman Kodak Company, Rochester, New York 14650-2011
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2
Analytical Technology Division, Eastman Kodak Company, Rochester, New York 14650-2155
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Тип публикации: Journal Article
Дата публикации: 1993-03-01
scimago Q1
wos Q2
БС1
SJR: 0.896
CiteScore: 6.1
Impact factor: 3.6
ISSN: 00036951, 10773118
Physics and Astronomy (miscellaneous)
Краткое описание
Lithium niobate thin films were deposited on (0001) sapphire using metalorganic chemical vapor deposition. An organometallic compound, formed by reaction of lithium dipivaloylmethanate and niobium(V) ethoxide, was used as a single-source precursor. The epitaxial nature of the films was established by x-ray diffraction and Rutherford backscattering analyses (RBS).
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ГОСТ
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Wernberg A. A. et al. Epitaxial growth of lithium niobate thin films from a single‐source organometallic precursor using metalorganic chemical vapor deposition // Applied Physics Letters. 1993. Vol. 62. No. 9. pp. 946-948.
ГОСТ со всеми авторами (до 50)
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Wernberg A. A., Gysling H. J., Filo A. J., Blanton T. N. Epitaxial growth of lithium niobate thin films from a single‐source organometallic precursor using metalorganic chemical vapor deposition // Applied Physics Letters. 1993. Vol. 62. No. 9. pp. 946-948.
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TY - JOUR
DO - 10.1063/1.108528
UR - https://doi.org/10.1063/1.108528
TI - Epitaxial growth of lithium niobate thin films from a single‐source organometallic precursor using metalorganic chemical vapor deposition
T2 - Applied Physics Letters
AU - Wernberg, Alex A
AU - Gysling, Henry J
AU - Filo, Albert J
AU - Blanton, Thomas N.
PY - 1993
DA - 1993/03/01
PB - AIP Publishing
SP - 946-948
IS - 9
VL - 62
SN - 0003-6951
SN - 1077-3118
ER -
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BibTex (до 50 авторов)
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@article{1993_Wernberg,
author = {Alex A Wernberg and Henry J Gysling and Albert J Filo and Thomas N. Blanton},
title = {Epitaxial growth of lithium niobate thin films from a single‐source organometallic precursor using metalorganic chemical vapor deposition},
journal = {Applied Physics Letters},
year = {1993},
volume = {62},
publisher = {AIP Publishing},
month = {mar},
url = {https://doi.org/10.1063/1.108528},
number = {9},
pages = {946--948},
doi = {10.1063/1.108528}
}
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MLA
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Wernberg, Alex A., et al. “Epitaxial growth of lithium niobate thin films from a single‐source organometallic precursor using metalorganic chemical vapor deposition.” Applied Physics Letters, vol. 62, no. 9, Mar. 1993, pp. 946-948. https://doi.org/10.1063/1.108528.
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