volume 134 issue 11

Negative Hall coefficient in band conduction region in heavily Al-doped 4H-SiC

Publication typeJournal Article
Publication date2023-09-15
scimago Q2
wos Q3
SJR0.580
CiteScore5.1
Impact factor2.5
ISSN00218979, 10897550
General Physics and Astronomy
Abstract

At low temperatures, the Hall coefficients in heavily Al-doped 4H-SiC are reported to be negative in the band conduction region as well as in the hopping conduction regions (i.e., nearest-neighbor hopping conduction region and variable-range hopping conduction region). A physical model was proposed to explain the negative sign of RH(T) in the hopping conduction regions. However, the negative value of RH(T) in the conduction band region remains unexplained. This study proposed a physical model to explain the negative value of RH(T) in the conduction band region. In addition to the valence band, doping copious amounts of Al acceptors in 4H-SiC causes a strong overlap of the wave functions of the excited states of Al acceptors, which results in the formation of allowed bands, referred to as allowed minibands. Although the holes can flow freely through the valence band as well as the allowed minibands, the energy–momentum relationship in the valence band and the allowed minibands determines the sign of RH(T). As elucidated here, if the holes flow primarily in the lower parts of the allowed minibands, the RH(T) in the band conduction region becomes negative, whereas if the holes flow primarily in the upper parts of the allowed minibands and the valence band, the RH(T) becomes positive.

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Matsuura H. et al. Negative Hall coefficient in band conduction region in heavily Al-doped 4H-SiC // Journal of Applied Physics. 2023. Vol. 134. No. 11.
GOST all authors (up to 50) Copy
Matsuura H., Hidaka A., Ji S., Eto K., Ishida Y., Yoshida S. Negative Hall coefficient in band conduction region in heavily Al-doped 4H-SiC // Journal of Applied Physics. 2023. Vol. 134. No. 11.
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RIS Copy
TY - JOUR
DO - 10.1063/5.0165404
UR - https://doi.org/10.1063/5.0165404
TI - Negative Hall coefficient in band conduction region in heavily Al-doped 4H-SiC
T2 - Journal of Applied Physics
AU - Matsuura, Hideharu
AU - Hidaka, Atsuki
AU - Ji, Shiyang
AU - Eto, Kazuma
AU - Ishida, Yuuki
AU - Yoshida, Sadafumi
PY - 2023
DA - 2023/09/15
PB - AIP Publishing
IS - 11
VL - 134
SN - 0021-8979
SN - 1089-7550
ER -
BibTex
Cite this
BibTex (up to 50 authors) Copy
@article{2023_Matsuura,
author = {Hideharu Matsuura and Atsuki Hidaka and Shiyang Ji and Kazuma Eto and Yuuki Ishida and Sadafumi Yoshida},
title = {Negative Hall coefficient in band conduction region in heavily Al-doped 4H-SiC},
journal = {Journal of Applied Physics},
year = {2023},
volume = {134},
publisher = {AIP Publishing},
month = {sep},
url = {https://doi.org/10.1063/5.0165404},
number = {11},
doi = {10.1063/5.0165404}
}