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Erratum: “Growth of β-Ga2O3 and ε/κ-Ga2O3 on AlN(0001) by molecular-beam epitaxy” [APL Mater. 11, 111113 (2023)]
Sushma Raghuvansy
1
,
Jonathan McCandless
1, 2
,
Marco Schowalter
1
,
A Karg
1
,
M. Alonso-Orts
1, 3
,
Martin S Williams
1
,
C. Tessarek
1
,
Stephan Figge
1
,
Kazuki Nomoto
2
,
Huili Xing
2, 4, 5
,
D. Schlom
4, 5, 6
,
Andreas Rosenauer
1, 3
,
Debdeep Jena
2, 4, 5
,
Martin Eickhoff
1, 3
,
P Vogt
1, 4
1
2
4
5
Publication type: Journal Article
Publication date: 2024-01-01
scimago Q1
wos Q2
SJR: 1.124
CiteScore: 7.9
Impact factor: 4.5
ISSN: 2166532X
General Materials Science
General Engineering
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Raghuvansy S. et al. Erratum: “Growth of β-Ga2O3 and ε/κ-Ga2O3 on AlN(0001) by molecular-beam epitaxy” [APL Mater. 11, 111113 (2023)] // APL Materials. 2024. Vol. 12. No. 1.
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Raghuvansy S., McCandless J., Schowalter M., Karg A., Alonso-Orts M., Williams M. S., Tessarek C., Figge S., Nomoto K., Xing H., Schlom D., Rosenauer A., Jena D., Eickhoff M., Vogt P. Erratum: “Growth of β-Ga2O3 and ε/κ-Ga2O3 on AlN(0001) by molecular-beam epitaxy” [APL Mater. 11, 111113 (2023)] // APL Materials. 2024. Vol. 12. No. 1.
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TY - JOUR
DO - 10.1063/5.0192370
UR - https://doi.org/10.1063/5.0192370
TI - Erratum: “Growth of β-Ga2O3 and ε/κ-Ga2O3 on AlN(0001) by molecular-beam epitaxy” [APL Mater. 11, 111113 (2023)]
T2 - APL Materials
AU - Raghuvansy, Sushma
AU - McCandless, Jonathan
AU - Schowalter, Marco
AU - Karg, A
AU - Alonso-Orts, M.
AU - Williams, Martin S
AU - Tessarek, C.
AU - Figge, Stephan
AU - Nomoto, Kazuki
AU - Xing, Huili
AU - Schlom, D.
AU - Rosenauer, Andreas
AU - Jena, Debdeep
AU - Eickhoff, Martin
AU - Vogt, P
PY - 2024
DA - 2024/01/01
PB - AIP Publishing
IS - 1
VL - 12
SN - 2166-532X
ER -
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@article{2024_Raghuvansy,
author = {Sushma Raghuvansy and Jonathan McCandless and Marco Schowalter and A Karg and M. Alonso-Orts and Martin S Williams and C. Tessarek and Stephan Figge and Kazuki Nomoto and Huili Xing and D. Schlom and Andreas Rosenauer and Debdeep Jena and Martin Eickhoff and P Vogt},
title = {Erratum: “Growth of β-Ga2O3 and ε/κ-Ga2O3 on AlN(0001) by molecular-beam epitaxy” [APL Mater. 11, 111113 (2023)]},
journal = {APL Materials},
year = {2024},
volume = {12},
publisher = {AIP Publishing},
month = {jan},
url = {https://doi.org/10.1063/5.0192370},
number = {1},
doi = {10.1063/5.0192370}
}