Formation of carbon nitride films with high N/C ratio by high‐pressure radio frequency magnetron sputtering
Тип публикации: Journal Article
Дата публикации: 1995-12-15
scimago Q2
wos Q3
БС1
SJR: 0.58
CiteScore: 5.1
Impact factor: 2.5
ISSN: 00218979, 10897550
General Physics and Astronomy
Краткое описание
Carbon nitride films were synthesized on Si(100) substrate using relatively high-pressure radio-frequency magnetron sputtering of a graphite target in a nitrogen ambient. The influences of the substrate temperature and pressure on deposition rate and the film composition ratio N/C and C–N bonding were investigated using x-ray photoelectron spectroscopy (XPS), and Fourier transform infrared spectroscopy (FTIR). The deposition rate had a maximum in the investigated pressure region and reduced as the substrate temperature increased. XPS spectra showed that the deposited films were very large N/C value up to 1.20, and unchanged after thermal treatment up to about 900 K, the latter confirmed by FTIR.
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Okada T. et al. Formation of carbon nitride films with high N/C ratio by high‐pressure radio frequency magnetron sputtering // Journal of Applied Physics. 1995. Vol. 78. No. 12. pp. 7416-7418.
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Okada T., Yamada S., Takeuchi Y., Wada T. Formation of carbon nitride films with high N/C ratio by high‐pressure radio frequency magnetron sputtering // Journal of Applied Physics. 1995. Vol. 78. No. 12. pp. 7416-7418.
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TY - JOUR
DO - 10.1063/1.360397
UR - https://doi.org/10.1063/1.360397
TI - Formation of carbon nitride films with high N/C ratio by high‐pressure radio frequency magnetron sputtering
T2 - Journal of Applied Physics
AU - Okada, T.
AU - Yamada, S.
AU - Takeuchi, Y
AU - Wada, T.
PY - 1995
DA - 1995/12/15
PB - AIP Publishing
SP - 7416-7418
IS - 12
VL - 78
SN - 0021-8979
SN - 1089-7550
ER -
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BibTex (до 50 авторов)
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@article{1995_Okada,
author = {T. Okada and S. Yamada and Y Takeuchi and T. Wada},
title = {Formation of carbon nitride films with high N/C ratio by high‐pressure radio frequency magnetron sputtering},
journal = {Journal of Applied Physics},
year = {1995},
volume = {78},
publisher = {AIP Publishing},
month = {dec},
url = {https://doi.org/10.1063/1.360397},
number = {12},
pages = {7416--7418},
doi = {10.1063/1.360397}
}
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MLA
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Okada, T., et al. “Formation of carbon nitride films with high N/C ratio by high‐pressure radio frequency magnetron sputtering.” Journal of Applied Physics, vol. 78, no. 12, Dec. 1995, pp. 7416-7418. https://doi.org/10.1063/1.360397.