Journal of Chemical Physics, volume 111, issue 19, pages 9111-9112
Embedded atom model calculations of the diffusion coefficient of Ni impurity in liquid Al
Publication type: Journal Article
Publication date: 1999-11-15
Journal:
Journal of Chemical Physics
Quartile SCImago
Q1
Quartile WOS
Q1
Impact factor: 4.4
ISSN: 00219606, 10897690
DOI:
10.1063/1.480252
Physical and Theoretical Chemistry
General Physics and Astronomy
Abstract
Using the embedded atom model potential for solid Ni–Al systems proposed by Voter and Chen, we performed molecular dynamics simulations to compute the diffusion coefficient of Ni impurity in liquid Al. Our results are in excellent agreement with available experimental data.
Top-30
Journals
|
1
2
|
|
|
Physical Review B
2 publications, 25%
|
|
|
Metallurgical and Materials Transactions A: Physical Metallurgy and Materials Science
2 publications, 25%
|
|
|
Journal of Non-Crystalline Solids
1 publication, 12.5%
|
|
|
Materials Science & Engineering A: Structural Materials: Properties, Microstructure and Processing
1 publication, 12.5%
|
|
|
Metals and Materials International
1 publication, 12.5%
|
|
|
Russian Chemical Reviews
1 publication, 12.5%
|
|
|
1
2
|
Publishers
|
1
2
|
|
|
American Physical Society (APS)
2 publications, 25%
|
|
|
Elsevier
2 publications, 25%
|
|
|
Springer Nature
2 publications, 25%
|
|
|
Korean Institute of Metals and Materials
1 publication, 12.5%
|
|
|
Autonomous Non-profit Organization Editorial Board of the journal Uspekhi Khimii
1 publication, 12.5%
|
|
|
1
2
|
- We do not take into account publications without a DOI.
- Statistics recalculated only for publications connected to researchers, organizations and labs registered on the platform.
- Statistics recalculated weekly.
Are you a researcher?
Create a profile to get free access to personal recommendations for colleagues and new articles.
Metrics
Cite this
GOST |
RIS |
BibTex |
MLA
Cite this
GOST
Copy
Alemany M., Rey C., GALLEGO L. J. Embedded atom model calculations of the diffusion coefficient of Ni impurity in liquid Al // Journal of Chemical Physics. 1999. Vol. 111. No. 19. pp. 9111-9112.
GOST all authors (up to 50)
Copy
Alemany M., Rey C., GALLEGO L. J. Embedded atom model calculations of the diffusion coefficient of Ni impurity in liquid Al // Journal of Chemical Physics. 1999. Vol. 111. No. 19. pp. 9111-9112.
Cite this
RIS
Copy
TY - JOUR
DO - 10.1063/1.480252
UR - https://doi.org/10.1063/1.480252
TI - Embedded atom model calculations of the diffusion coefficient of Ni impurity in liquid Al
T2 - Journal of Chemical Physics
AU - Alemany, M.M.G.
AU - Rey, C
AU - GALLEGO, L. J.
PY - 1999
DA - 1999/11/15
PB - AIP Publishing
SP - 9111-9112
IS - 19
VL - 111
SN - 0021-9606
SN - 1089-7690
ER -
Cite this
BibTex
Copy
@article{1999_Alemany,
author = {M.M.G. Alemany and C Rey and L. J. GALLEGO},
title = {Embedded atom model calculations of the diffusion coefficient of Ni impurity in liquid Al},
journal = {Journal of Chemical Physics},
year = {1999},
volume = {111},
publisher = {AIP Publishing},
month = {nov},
url = {https://doi.org/10.1063/1.480252},
number = {19},
pages = {9111--9112},
doi = {10.1063/1.480252}
}
Cite this
MLA
Copy
Alemany, M.M.G., et al. “Embedded atom model calculations of the diffusion coefficient of Ni impurity in liquid Al.” Journal of Chemical Physics, vol. 111, no. 19, Nov. 1999, pp. 9111-9112. https://doi.org/10.1063/1.480252.