Journal of Chemical Physics, volume 111, issue 19, pages 9111-9112

Embedded atom model calculations of the diffusion coefficient of Ni impurity in liquid Al

M.M.G. Alemany ¹

C Rey ¹

L. J. GALLEGO ¹

Departamento de Fı́sica de la Materia Condensada, Facultad de Fı́sica, Universidad de Santiago de Compostela, E-15706 Santiago de Compostela, Spain |

Publication type: Journal Article

Publication date: 1999-11-15

AIP Publishing

Journal: Journal of Chemical Physics

scimago Q1

SJR: 1.101

CiteScore: 7.4

Impact factor: 3.1

ISSN: 00219606, 10897690

DOI: 10.1063/1.480252

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Physical and Theoretical Chemistry

General Physics and Astronomy

Abstract

Using the embedded atom model potential for solid Ni–Al systems proposed by Voter and Chen, we performed molecular dynamics simulations to compute the diffusion coefficient of Ni impurity in liquid Al. Our results are in excellent agreement with available experimental data.

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Publisher

AIP Publishing

Journal

Journal of Chemical Physics

scimago Q1

SJR

1.101

CiteScore

7.4

Impact factor

3.1

ISSN

00219606 (Print)

10897690 (Electronic)

Embedded atom model calculations of the diffusion coefficient of Ni impurity in liquid Al

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