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Local sensor based on nanowire field effect transistor from inhomogeneously doped silicon on insulator

Тип публикацииJournal Article
Дата публикации2018-02-07
scimago Q2
wos Q3
white level БС1
SJR0.58
CiteScore5.1
Impact factor2.5
ISSN00218979, 10897550
General Physics and Astronomy
Краткое описание
We present the original method for fabricating a sensitive field/charge sensor based on field effect transistor (FET) with a nanowire channel that uses CMOS-compatible processes only. A FET with a kink-like silicon nanowire channel was fabricated from the inhomogeneously doped silicon on insulator wafer very close (∼100 nm) to the extremely sharp corner of a silicon chip forming local probe. The single e-beam lithographic process with a shadow deposition technique, followed by separate two reactive ion etching processes, was used to define the narrow semiconductor nanowire channel. The sensors charge sensitivity was evaluated to be in the range of 0.1–0.2 e/Hz from the analysis of their transport and noise characteristics. The proposed method provides a good opportunity for the relatively simple manufacture of a local field sensor for measuring the electrical field distribution, potential profiles, and charge dynamics for a wide range of mesoscopic objects. Diagnostic systems and devices based on such sensors can be used in various fields of physics, chemistry, material science, biology, electronics, medicine, etc.We present the original method for fabricating a sensitive field/charge sensor based on field effect transistor (FET) with a nanowire channel that uses CMOS-compatible processes only. A FET with a kink-like silicon nanowire channel was fabricated from the inhomogeneously doped silicon on insulator wafer very close (∼100 nm) to the extremely sharp corner of a silicon chip forming local probe. The single e-beam lithographic process with a shadow deposition technique, followed by separate two reactive ion etching processes, was used to define the narrow semiconductor nanowire channel. The sensors charge sensitivity was evaluated to be in the range of 0.1–0.2 e/Hz from the analysis of their transport and noise characteristics. The proposed method provides a good opportunity for the relatively simple manufacture of a local field sensor for measuring the electrical field distribution, potential profiles, and charge dynamics for a wide range of mesoscopic objects. Diagnostic systems and devices based on such se...
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ГОСТ |
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Presnov D. E. et al. Local sensor based on nanowire field effect transistor from inhomogeneously doped silicon on insulator // Journal of Applied Physics. 2018. Vol. 123. No. 5. p. 54503.
ГОСТ со всеми авторами (до 50) Скопировать
Presnov D. E., Bozhev I. V., Miakonkikh A., Simakin S. G., Trifonov A. S., Krupenin V. Local sensor based on nanowire field effect transistor from inhomogeneously doped silicon on insulator // Journal of Applied Physics. 2018. Vol. 123. No. 5. p. 54503.
RIS |
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TY - JOUR
DO - 10.1063/1.5019250
UR - https://pubs.aip.org/jap/article/123/5/054503/155023/Local-sensor-based-on-nanowire-field-effect
TI - Local sensor based on nanowire field effect transistor from inhomogeneously doped silicon on insulator
T2 - Journal of Applied Physics
AU - Presnov, Denis E.
AU - Bozhev, Ivan V
AU - Miakonkikh, Andrey
AU - Simakin, Sergey G
AU - Trifonov, Artem S.
AU - Krupenin, V.A.
PY - 2018
DA - 2018/02/07
PB - AIP Publishing
SP - 54503
IS - 5
VL - 123
SN - 0021-8979
SN - 1089-7550
ER -
BibTex |
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BibTex (до 50 авторов) Скопировать
@article{2018_Presnov,
author = {Denis E. Presnov and Ivan V Bozhev and Andrey Miakonkikh and Sergey G Simakin and Artem S. Trifonov and V.A. Krupenin},
title = {Local sensor based on nanowire field effect transistor from inhomogeneously doped silicon on insulator},
journal = {Journal of Applied Physics},
year = {2018},
volume = {123},
publisher = {AIP Publishing},
month = {feb},
url = {https://pubs.aip.org/jap/article/123/5/054503/155023/Local-sensor-based-on-nanowire-field-effect},
number = {5},
pages = {54503},
doi = {10.1063/1.5019250}
}
MLA
Цитировать
Presnov, Denis E., et al. “Local sensor based on nanowire field effect transistor from inhomogeneously doped silicon on insulator.” Journal of Applied Physics, vol. 123, no. 5, Feb. 2018, p. 54503. https://pubs.aip.org/jap/article/123/5/054503/155023/Local-sensor-based-on-nanowire-field-effect.
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