volume 123 issue 5 pages 54503

Local sensor based on nanowire field effect transistor from inhomogeneously doped silicon on insulator

Publication typeJournal Article
Publication date2018-02-07
scimago Q2
wos Q3
SJR0.580
CiteScore5.1
Impact factor2.5
ISSN00218979, 10897550
General Physics and Astronomy
Abstract
We present the original method for fabricating a sensitive field/charge sensor based on field effect transistor (FET) with a nanowire channel that uses CMOS-compatible processes only. A FET with a kink-like silicon nanowire channel was fabricated from the inhomogeneously doped silicon on insulator wafer very close (∼100 nm) to the extremely sharp corner of a silicon chip forming local probe. The single e-beam lithographic process with a shadow deposition technique, followed by separate two reactive ion etching processes, was used to define the narrow semiconductor nanowire channel. The sensors charge sensitivity was evaluated to be in the range of 0.1–0.2 e/Hz from the analysis of their transport and noise characteristics. The proposed method provides a good opportunity for the relatively simple manufacture of a local field sensor for measuring the electrical field distribution, potential profiles, and charge dynamics for a wide range of mesoscopic objects. Diagnostic systems and devices based on such sensors can be used in various fields of physics, chemistry, material science, biology, electronics, medicine, etc.We present the original method for fabricating a sensitive field/charge sensor based on field effect transistor (FET) with a nanowire channel that uses CMOS-compatible processes only. A FET with a kink-like silicon nanowire channel was fabricated from the inhomogeneously doped silicon on insulator wafer very close (∼100 nm) to the extremely sharp corner of a silicon chip forming local probe. The single e-beam lithographic process with a shadow deposition technique, followed by separate two reactive ion etching processes, was used to define the narrow semiconductor nanowire channel. The sensors charge sensitivity was evaluated to be in the range of 0.1–0.2 e/Hz from the analysis of their transport and noise characteristics. The proposed method provides a good opportunity for the relatively simple manufacture of a local field sensor for measuring the electrical field distribution, potential profiles, and charge dynamics for a wide range of mesoscopic objects. Diagnostic systems and devices based on such se...
Found 
Found 

Top-30

Journals

1
2
3
4
5
6
7
Moscow University Physics Bulletin (English Translation of Vestnik Moskovskogo Universiteta, Fizika)
7 publications, 46.67%
Technical Physics
1 publication, 6.67%
Proceedings of SPIE - The International Society for Optical Engineering
1 publication, 6.67%
Nanotechnology
1 publication, 6.67%
Materials Science in Semiconductor Processing
1 publication, 6.67%
Macromolecular Bioscience
1 publication, 6.67%
Vestnik Moskovskogo Universiteta Seriya 3 Fizika Astronomiya
1 publication, 6.67%
Small
1 publication, 6.67%
Polymers
1 publication, 6.67%
1
2
3
4
5
6
7

Publishers

1
2
3
4
5
6
7
Pleiades Publishing
7 publications, 46.67%
Wiley
2 publications, 13.33%
SPIE-Intl Soc Optical Eng
1 publication, 6.67%
IOP Publishing
1 publication, 6.67%
Elsevier
1 publication, 6.67%
Moscow University Press
1 publication, 6.67%
MDPI
1 publication, 6.67%
Allerton Press
1 publication, 6.67%
1
2
3
4
5
6
7
  • We do not take into account publications without a DOI.
  • Statistics recalculated weekly.

Are you a researcher?

Create a profile to get free access to personal recommendations for colleagues and new articles.
Metrics
15
Share
Cite this
GOST |
Cite this
GOST Copy
Presnov D. E. et al. Local sensor based on nanowire field effect transistor from inhomogeneously doped silicon on insulator // Journal of Applied Physics. 2018. Vol. 123. No. 5. p. 54503.
GOST all authors (up to 50) Copy
Presnov D. E., Bozhev I. V., Miakonkikh A., Simakin S. G., Trifonov A. S., Krupenin V. Local sensor based on nanowire field effect transistor from inhomogeneously doped silicon on insulator // Journal of Applied Physics. 2018. Vol. 123. No. 5. p. 54503.
RIS |
Cite this
RIS Copy
TY - JOUR
DO - 10.1063/1.5019250
UR - https://pubs.aip.org/jap/article/123/5/054503/155023/Local-sensor-based-on-nanowire-field-effect
TI - Local sensor based on nanowire field effect transistor from inhomogeneously doped silicon on insulator
T2 - Journal of Applied Physics
AU - Presnov, Denis E.
AU - Bozhev, Ivan V
AU - Miakonkikh, Andrey
AU - Simakin, Sergey G
AU - Trifonov, Artem S.
AU - Krupenin, V.A.
PY - 2018
DA - 2018/02/07
PB - AIP Publishing
SP - 54503
IS - 5
VL - 123
SN - 0021-8979
SN - 1089-7550
ER -
BibTex |
Cite this
BibTex (up to 50 authors) Copy
@article{2018_Presnov,
author = {Denis E. Presnov and Ivan V Bozhev and Andrey Miakonkikh and Sergey G Simakin and Artem S. Trifonov and V.A. Krupenin},
title = {Local sensor based on nanowire field effect transistor from inhomogeneously doped silicon on insulator},
journal = {Journal of Applied Physics},
year = {2018},
volume = {123},
publisher = {AIP Publishing},
month = {feb},
url = {https://pubs.aip.org/jap/article/123/5/054503/155023/Local-sensor-based-on-nanowire-field-effect},
number = {5},
pages = {54503},
doi = {10.1063/1.5019250}
}
MLA
Cite this
MLA Copy
Presnov, Denis E., et al. “Local sensor based on nanowire field effect transistor from inhomogeneously doped silicon on insulator.” Journal of Applied Physics, vol. 123, no. 5, Feb. 2018, p. 54503. https://pubs.aip.org/jap/article/123/5/054503/155023/Local-sensor-based-on-nanowire-field-effect.