volume 2627 pages 20002

Modeling the deposition of an additional layer to improve the interface of spin valve nanolayers

Alexander Vakhrushev
Publication typeProceedings Article
Publication date2023-05-01
SJR0.153
CiteScore0.5
Impact factor
ISSN0094243X, 15517616
Found 

Are you a researcher?

Create a profile to get free access to personal recommendations for colleagues and new articles.
Metrics
0
Share
Cite this
GOST |
Cite this
GOST Copy
Fedotov A., Vakhrushev A., Sidorenko A. Modeling the deposition of an additional layer to improve the interface of spin valve nanolayers // AIP Conference Proceedings. 2023. Vol. 2627. p. 20002.
GOST all authors (up to 50) Copy
Fedotov A., Vakhrushev A., Sidorenko A. Modeling the deposition of an additional layer to improve the interface of spin valve nanolayers // AIP Conference Proceedings. 2023. Vol. 2627. p. 20002.
RIS |
Cite this
RIS Copy
TY - CPAPER
DO - 10.1063/5.0115094
UR - http://aip.scitation.org/doi/abs/10.1063/5.0115094
TI - Modeling the deposition of an additional layer to improve the interface of spin valve nanolayers
T2 - AIP Conference Proceedings
AU - Fedotov, Aleksey
AU - Vakhrushev, Alexander
AU - Sidorenko, Anatoliy
PY - 2023
DA - 2023/05/01
PB - AIP Publishing
SP - 20002
VL - 2627
SN - 0094-243X
SN - 1551-7616
ER -
BibTex
Cite this
BibTex (up to 50 authors) Copy
@inproceedings{2023_Fedotov,
author = {Aleksey Fedotov and Alexander Vakhrushev and Anatoliy Sidorenko},
title = {Modeling the deposition of an additional layer to improve the interface of spin valve nanolayers},
year = {2023},
volume = {2627},
pages = {20002},
month = {may},
publisher = {AIP Publishing}
}