volume 98 issue 1-4 pages 27-33

Implantation and thermal annealing behaviour of Bi imlanted into the Al/KCl bilayer compound

C A Oliviri 1, 2
M. Behar 1
P. F. P. FICHTNER 1
F. C. ZAWISLAK 1
D Fink) 3
J. P. Biersack 3
Publication typeJournal Article
Publication date1986-09-01
SJR
CiteScore
Impact factor
ISSN00337579
General Engineering
Found 
Found 
  • We do not take into account publications without a DOI.
  • Statistics recalculated weekly.

Are you a researcher?

Create a profile to get free access to personal recommendations for colleagues and new articles.
Metrics
1
Share
Cite this
GOST |
Cite this
GOST Copy
Oliviri C. A. et al. Implantation and thermal annealing behaviour of Bi imlanted into the Al/KCl bilayer compound // Radiation Effects. 1986. Vol. 98. No. 1-4. pp. 27-33.
GOST all authors (up to 50) Copy
Oliviri C. A., Behar M., FICHTNER P. F. P., ZAWISLAK F. C., Fink) D., Biersack J. P. Implantation and thermal annealing behaviour of Bi imlanted into the Al/KCl bilayer compound // Radiation Effects. 1986. Vol. 98. No. 1-4. pp. 27-33.
RIS |
Cite this
RIS Copy
TY - JOUR
DO - 10.1080/00337578608206094
UR - https://doi.org/10.1080/00337578608206094
TI - Implantation and thermal annealing behaviour of Bi imlanted into the Al/KCl bilayer compound
T2 - Radiation Effects
AU - Oliviri, C A
AU - Behar, M.
AU - FICHTNER, P. F. P.
AU - ZAWISLAK, F. C.
AU - Fink), D
AU - Biersack, J. P.
PY - 1986
DA - 1986/09/01
PB - Taylor & Francis
SP - 27-33
IS - 1-4
VL - 98
SN - 0033-7579
ER -
BibTex |
Cite this
BibTex (up to 50 authors) Copy
@article{1986_Oliviri,
author = {C A Oliviri and M. Behar and P. F. P. FICHTNER and F. C. ZAWISLAK and D Fink) and J. P. Biersack},
title = {Implantation and thermal annealing behaviour of Bi imlanted into the Al/KCl bilayer compound},
journal = {Radiation Effects},
year = {1986},
volume = {98},
publisher = {Taylor & Francis},
month = {sep},
url = {https://doi.org/10.1080/00337578608206094},
number = {1-4},
pages = {27--33},
doi = {10.1080/00337578608206094}
}
MLA
Cite this
MLA Copy
Oliviri, C. A., et al. “Implantation and thermal annealing behaviour of Bi imlanted into the Al/KCl bilayer compound.” Radiation Effects, vol. 98, no. 1-4, Sep. 1986, pp. 27-33. https://doi.org/10.1080/00337578608206094.