Implantation and thermal annealing behaviour of Bi imlanted into the Al/KCl bilayer compound
C A Oliviri
1, 2
,
M. Behar
1
,
P. F. P. FICHTNER
1
,
F. C. ZAWISLAK
1
,
D Fink)
3
,
J. P. Biersack
3
3
b Hahn-Meitner-Institut für Kernforschung , Berlin , West Germany
|
Publication type: Journal Article
Publication date: 1986-09-01
General Engineering
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Oliviri C. A. et al. Implantation and thermal annealing behaviour of Bi imlanted into the Al/KCl bilayer compound // Radiation Effects. 1986. Vol. 98. No. 1-4. pp. 27-33.
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Oliviri C. A., Behar M., FICHTNER P. F. P., ZAWISLAK F. C., Fink) D., Biersack J. P. Implantation and thermal annealing behaviour of Bi imlanted into the Al/KCl bilayer compound // Radiation Effects. 1986. Vol. 98. No. 1-4. pp. 27-33.
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TY - JOUR
DO - 10.1080/00337578608206094
UR - https://doi.org/10.1080/00337578608206094
TI - Implantation and thermal annealing behaviour of Bi imlanted into the Al/KCl bilayer compound
T2 - Radiation Effects
AU - Oliviri, C A
AU - Behar, M.
AU - FICHTNER, P. F. P.
AU - ZAWISLAK, F. C.
AU - Fink), D
AU - Biersack, J. P.
PY - 1986
DA - 1986/09/01
PB - Taylor & Francis
SP - 27-33
IS - 1-4
VL - 98
SN - 0033-7579
ER -
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@article{1986_Oliviri,
author = {C A Oliviri and M. Behar and P. F. P. FICHTNER and F. C. ZAWISLAK and D Fink) and J. P. Biersack},
title = {Implantation and thermal annealing behaviour of Bi imlanted into the Al/KCl bilayer compound},
journal = {Radiation Effects},
year = {1986},
volume = {98},
publisher = {Taylor & Francis},
month = {sep},
url = {https://doi.org/10.1080/00337578608206094},
number = {1-4},
pages = {27--33},
doi = {10.1080/00337578608206094}
}
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MLA
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Oliviri, C. A., et al. “Implantation and thermal annealing behaviour of Bi imlanted into the Al/KCl bilayer compound.” Radiation Effects, vol. 98, no. 1-4, Sep. 1986, pp. 27-33. https://doi.org/10.1080/00337578608206094.