volume 43 issue 20 pages 205101

The influences of device geometry and p-type doping on a solution-processed polymer space-charge-limited transistor

Publication typeJournal Article
Publication date2010-05-04
scimago Q1
wos Q2
SJR0.650
CiteScore6.4
Impact factor3.2
ISSN00223727, 13616463
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Acoustics and Ultrasonics
Abstract
A polymer vertical transistor with an on/off current ratio higher than 10 4 is demonstrated. The proposed space-charge limited transistor (SCLT) uses a metal-grid base containing high-density submicrometre openings to modulate the vertical space-charge-limited current (SCLC). The key to obtaining a high on/off current ratio is to reduce the leakage current of SCLT. In this paper, an improved device structure that isolates the grid metal by using both top and bottom insulating layers is demonstrated. Then, with an identical proposed structure, the geometric design is also found to significantly influence the on/off ratio over 3 orders of magnitude. The competition between the SCLC and the grid to collector leakage current is analysed. Finally, the influence of tetrafluoro-tetracyano-quinodimethane doping on the transistor characteristics is investigated. The results are important for the design of polymer vertical transistors with high on/off ratios. (Some figures in this article are in colour only in the electronic version)
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Chao Yu. C. et al. The influences of device geometry and p-type doping on a solution-processed polymer space-charge-limited transistor // Journal Physics D: Applied Physics. 2010. Vol. 43. No. 20. p. 205101.
GOST all authors (up to 50) Copy
Chao Yu. C., Chen C., Zan H., Meng H. The influences of device geometry and p-type doping on a solution-processed polymer space-charge-limited transistor // Journal Physics D: Applied Physics. 2010. Vol. 43. No. 20. p. 205101.
RIS |
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RIS Copy
TY - JOUR
DO - 10.1088/0022-3727/43/20/205101
UR - https://doi.org/10.1088/0022-3727/43/20/205101
TI - The influences of device geometry and p-type doping on a solution-processed polymer space-charge-limited transistor
T2 - Journal Physics D: Applied Physics
AU - Chao, Yu Chiang
AU - Chen, Chun-Yu
AU - Zan, Hsiao-Wen
AU - Meng, H.F.
PY - 2010
DA - 2010/05/04
PB - IOP Publishing
SP - 205101
IS - 20
VL - 43
SN - 0022-3727
SN - 1361-6463
ER -
BibTex |
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BibTex (up to 50 authors) Copy
@article{2010_Chao,
author = {Yu Chiang Chao and Chun-Yu Chen and Hsiao-Wen Zan and H.F. Meng},
title = {The influences of device geometry and p-type doping on a solution-processed polymer space-charge-limited transistor},
journal = {Journal Physics D: Applied Physics},
year = {2010},
volume = {43},
publisher = {IOP Publishing},
month = {may},
url = {https://doi.org/10.1088/0022-3727/43/20/205101},
number = {20},
pages = {205101},
doi = {10.1088/0022-3727/43/20/205101}
}
MLA
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MLA Copy
Chao, Yu. Chiang, et al. “The influences of device geometry and p-type doping on a solution-processed polymer space-charge-limited transistor.” Journal Physics D: Applied Physics, vol. 43, no. 20, May. 2010, p. 205101. https://doi.org/10.1088/0022-3727/43/20/205101.