Helium focused ion beam irradiation with subsequent chemical etching for the fabrication of nanostructures
Publication type: Journal Article
Publication date: 2020-03-09
scimago Q2
wos Q2
SJR: 0.597
CiteScore: 6.2
Impact factor: 2.8
ISSN: 09574484, 13616528
PubMed ID:
31978916
General Chemistry
General Materials Science
Electrical and Electronic Engineering
Mechanical Engineering
Bioengineering
Mechanics of Materials
Abstract
In this paper we demonstrate a nanofabrication technique based on local ion irradiation of silicon dioxide with a focused helium ion beam. The wet etching of silicon dioxide irradiated with a focused helium ion beam is described in a two-dimensional case both numerically and experimentally. We suggest a model for the etching process based on the distribution of ion induced defects in the irradiated material. The profile of the surface of the etched silicon dioxide is simulated and compared with the results from scanning electron microscopy. Fabrication of a suspended nanostring with a diameter of less than 20 nm by means of etching ion-irradiated material is demonstrated.
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Metrics
8
Total citations:
8
Citations from 2025:
1
(12.5%)
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GOST
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Petrov Yu. V., Grigoryev E. A., Baraban A. Helium focused ion beam irradiation with subsequent chemical etching for the fabrication of nanostructures // Nanotechnology. 2020. Vol. 31. No. 21. p. 215301.
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Petrov Yu. V., Grigoryev E. A., Baraban A. Helium focused ion beam irradiation with subsequent chemical etching for the fabrication of nanostructures // Nanotechnology. 2020. Vol. 31. No. 21. p. 215301.
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RIS
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TY - JOUR
DO - 10.1088/1361-6528/ab6fe3
UR - https://doi.org/10.1088/1361-6528/ab6fe3
TI - Helium focused ion beam irradiation with subsequent chemical etching for the fabrication of nanostructures
T2 - Nanotechnology
AU - Petrov, Yu V
AU - Grigoryev, E A
AU - Baraban, A.P.
PY - 2020
DA - 2020/03/09
PB - IOP Publishing
SP - 215301
IS - 21
VL - 31
PMID - 31978916
SN - 0957-4484
SN - 1361-6528
ER -
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BibTex (up to 50 authors)
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@article{2020_Petrov,
author = {Yu V Petrov and E A Grigoryev and A.P. Baraban},
title = {Helium focused ion beam irradiation with subsequent chemical etching for the fabrication of nanostructures},
journal = {Nanotechnology},
year = {2020},
volume = {31},
publisher = {IOP Publishing},
month = {mar},
url = {https://doi.org/10.1088/1361-6528/ab6fe3},
number = {21},
pages = {215301},
doi = {10.1088/1361-6528/ab6fe3}
}
Cite this
MLA
Copy
Petrov, Yu. V., et al. “Helium focused ion beam irradiation with subsequent chemical etching for the fabrication of nanostructures.” Nanotechnology, vol. 31, no. 21, Mar. 2020, p. 215301. https://doi.org/10.1088/1361-6528/ab6fe3.
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