Physical Review B, volume 1, issue 4, pages 1382-1389

Electrical-Resistivity Model for Polycrystalline Films: the Case of Arbitrary Reflection at External Surfaces

A. F. Mayadas 1
M. Shatzkes 2
1
 
IBM Watson Research Center, yorktown Heights, New York 10598
2
 
IBM Components Division Laboratory, East Fiskhill, New York 12533
Publication typeJournal Article
Publication date1970-02-15
Quartile SCImago
Q1
Quartile WOS
Q2
Impact factor3.7
ISSN24699950, 24699969, 10980121, 1550235X
Abstract
In this paper, the total resistivity of a thin metal film is calculated from a model in which three types of electron scattering mechanisms are simultaneously operative: an isotropic background scattering (due to the combined effects of phonons and point defects), scattering due to a distribution of planar potentials (grain boundaries), and scattering due to the external surfaces. The intrinsic or bulk resistivity is obtained by solving a Boltzmann equation in which both grain-boundary and background scattering are accounted for. The total resistivity is obtained by imposing boundary conditions due to the external surfaces (as in the Fuchs theory) on this Boltzmann equation. Interpretation of published data on grain-boundary scattering in bulk materials in terms of the calculated intrinsic resistivity, and of thin-film data in terms of the calculated total resistivity suggests that (i) the grain-boundary reflection coefficient in Al is \ensuremath{\approx} 0.15, while it is somewhat higher in Cu; (ii) the observed thickness dependence of the resistivity in thin films is due to grain-boundary scattering as well as to the Fuchs size effect; and (iii) the common observation that single-crystal films possess lower resistivities than polycrystalline films may be accounted for by grain-boundary effects rather than by differences in the nature of surface scattering.

Top-30

Citations by journals

50
100
150
200
250
Thin Solid Films
204 publications, 10.82%
Journal of Applied Physics
167 publications, 8.86%
Physical Review B
94 publications, 4.99%
Applied Physics Letters
45 publications, 2.39%
Applied Surface Science
39 publications, 2.07%
Journal of Materials Science
38 publications, 2.02%
phys stat sol (a)
37 publications, 1.96%
Microelectronic Engineering
33 publications, 1.75%
Journal Physics D: Applied Physics
28 publications, 1.49%
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
28 publications, 1.49%
Journal of Materials Science Letters
26 publications, 1.38%
Journal of the Electrochemical Society
24 publications, 1.27%
MRS Proceedings
23 publications, 1.22%
Vacuum
22 publications, 1.17%
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
22 publications, 1.17%
IEEE Transactions on Electron Devices
21 publications, 1.11%
Nanotechnology
19 publications, 1.01%
Journal of Alloys and Compounds
18 publications, 0.95%
Journal of Physics Condensed Matter
16 publications, 0.85%
Scientific Reports
15 publications, 0.8%
Applied Physics A: Materials Science and Processing
15 publications, 0.8%
Surface Science
14 publications, 0.74%
Journal of Materials Science: Materials in Electronics
14 publications, 0.74%
Acta Materialia
14 publications, 0.74%
Journal of Electronic Materials
13 publications, 0.69%
Nano Letters
12 publications, 0.64%
ACS applied materials & interfaces
12 publications, 0.64%
Surface and Coatings Technology
11 publications, 0.58%
Journal of Physics F Metal Physics
11 publications, 0.58%
50
100
150
200
250

Citations by publishers

100
200
300
400
500
600
Elsevier
563 publications, 29.87%
American Institute of Physics (AIP)
237 publications, 12.57%
Springer Nature
191 publications, 10.13%
IEEE
158 publications, 8.38%
American Physical Society (APS)
121 publications, 6.42%
IOP Publishing
114 publications, 6.05%
Wiley
99 publications, 5.25%
American Chemical Society (ACS)
58 publications, 3.08%
American Vacuum Society
38 publications, 2.02%
Japan Society of Applied Physics
27 publications, 1.43%
The Electrochemical Society
26 publications, 1.38%
Multidisciplinary Digital Publishing Institute (MDPI)
23 publications, 1.22%
Materials Research Society
23 publications, 1.22%
Royal Society of Chemistry (RSC)
21 publications, 1.11%
Pleiades Publishing
20 publications, 1.06%
Taylor & Francis
19 publications, 1.01%
Japan Institute of Metals and Materials
10 publications, 0.53%
Cambridge University Press
9 publications, 0.48%
World Scientific
7 publications, 0.37%
Optical Society of America
6 publications, 0.32%
Association for Computing Machinery (ACM)
5 publications, 0.27%
Trans Tech Publications
5 publications, 0.27%
G.V. Kurdyumov Institute for Metal Physics of N.A.S. of Ukraine
5 publications, 0.27%
Physical Society of Japan
4 publications, 0.21%
Chinese Physical Society
4 publications, 0.21%
ASME
3 publications, 0.16%
American Association for the Advancement of Science (AAAS)
3 publications, 0.16%
Hindawi Limited
3 publications, 0.16%
American Institute of Aeronautics and Astronautics (AIAA)
2 publications, 0.11%
100
200
300
400
500
600
  • We do not take into account publications without a DOI.
  • Statistics recalculated only for publications connected to researchers, organizations and labs registered on the platform.
  • Statistics recalculated weekly.

Are you a researcher?

Create a profile to get free access to personal recommendations for colleagues and new articles.
Metrics
Share
Cite this
GOST |
Cite this
GOST Copy
Mayadas A. F., Shatzkes M. Electrical-Resistivity Model for Polycrystalline Films: the Case of Arbitrary Reflection at External Surfaces // Physical Review B. 1970. Vol. 1. No. 4. pp. 1382-1389.
GOST all authors (up to 50) Copy
Mayadas A. F., Shatzkes M. Electrical-Resistivity Model for Polycrystalline Films: the Case of Arbitrary Reflection at External Surfaces // Physical Review B. 1970. Vol. 1. No. 4. pp. 1382-1389.
RIS |
Cite this
RIS Copy
TY - JOUR
DO - 10.1103/PhysRevB.1.1382
UR - https://doi.org/10.1103/PhysRevB.1.1382
TI - Electrical-Resistivity Model for Polycrystalline Films: the Case of Arbitrary Reflection at External Surfaces
T2 - Physical Review B
AU - Mayadas, A. F.
AU - Shatzkes, M.
PY - 1970
DA - 1970/02/15
PB - American Physical Society (APS)
SP - 1382-1389
IS - 4
VL - 1
SN - 2469-9950
SN - 2469-9969
SN - 1098-0121
SN - 1550-235X
ER -
BibTex |
Cite this
BibTex Copy
@article{1970_Mayadas,
author = {A. F. Mayadas and M. Shatzkes},
title = {Electrical-Resistivity Model for Polycrystalline Films: the Case of Arbitrary Reflection at External Surfaces},
journal = {Physical Review B},
year = {1970},
volume = {1},
publisher = {American Physical Society (APS)},
month = {feb},
url = {https://doi.org/10.1103/PhysRevB.1.1382},
number = {4},
pages = {1382--1389},
doi = {10.1103/PhysRevB.1.1382}
}
MLA
Cite this
MLA Copy
Mayadas, A. F., and M. Shatzkes. “Electrical-Resistivity Model for Polycrystalline Films: the Case of Arbitrary Reflection at External Surfaces.” Physical Review B, vol. 1, no. 4, Feb. 1970, pp. 1382-1389. https://doi.org/10.1103/PhysRevB.1.1382.
Found error?