Study and Optimization of Photo Resistor Etch Back Loop in HK Metal Gate

Yajie Li 1
, 
Baichun Zhang 1
, 
Jianguo Yang 1
, 
Lei Sun 1
, 
Quanbo Li 1
, 
Yu Zhang 1
1
 
Shanghai Huali Integrated Circuit Corporation | 
Publication type: Proceedings Article
Publication date: 2022-06-20
Institute of Electrical and Electronics Engineers (IEEE)
Found 

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