IEEE Letters on Electromagnetic Compatibility Practice and Applications, volume 6, issue 4, pages 132-137

Deep Learning and ECM Fusion for Realization of Advanced Resistive Ink FSS-Based Customized Microwave Absorber

Anjali Agrawal ¹

Anil Kumar ^{1, 2}

Ravi Panwar ^{3, 4}

Discipline of Electronics and Communication Engineering, Indian Institute of Information Technology, Design and Manufacturing, Jabalpur, Jabalpur, India |

Discipline of Electronics and Communication Engineering, Indian Institute of Information Technology, Design and Manufactuirng, Jabalpur-, Madhya Pradesh, India |

School of Materials Science and Technology, High Frequency Materials and Structures Laboratory, Indian Institute of Technology (Banaras Hindu University)-IIT BHU, Varanasi-, Uttar Pradesh, India |

⁴

School of Materials Science and Technology, Indian Institute of Technology (Banaras Hindu University) Varanasi, Varanasi, India |

Publication type: Journal Article

Publication date: 2024-12-01

Institute of Electrical and Electronics Engineers (IEEE)

Journal: IEEE Letters on Electromagnetic Compatibility Practice and Applications

SJR: —

CiteScore: —

Impact factor: 0.9

ISSN: 26376423

DOI: 10.1109/lemcpa.2024.3458790

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Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Journal

IEEE Letters on Electromagnetic Compatibility Practice and Applications

SJR

—

CiteScore

—

Impact factor

0.9

ISSN

26376423 (Electronic)