Obtaining Silicon Oxide Nanoparticles Doped with Fluorine and Gold Particles by the Pulsed Plasma-Chemical Method

This paper presents a study on pulsed plasma-chemical synthesis of fluorine- and gold-doped silicon oxide nanopowder. The gold- and fluorine-containing precursors were gold chloride (AuCl₃) and sulphur hexafluoride (SF₆). Pulsed plasma-chemical synthesis is realized on the laboratory stand, including a plasma-chemical reactor and TEA-500 electron accelerator. The parameters of the electron beam are as follows: 400–450 keV electron energy, 60 ns half-amplitude pulse duration, up to 200 J pulse energy, and 5 cm beam diameter. We confirmed the composite structure of Si_xO_y@Au by using transmission electron microscopy and energy-dispersive spectroscopy. We determined the chemical composition and morphology of synthesized Si_xO_y@Au and Si_xO_y@F nanocomposites. The material contained a Si_xO_y@Au carrier with an average size of 50–150 nm and a shell of fine particles with an average size of 5–10 nm.