Open Access
Open access
Advanced Optical Technologies, volume 7, issue 1-2, pages 49-55

Design and manufacture of super-multilayer optical filters based on PARMS technology

Shaobo Lu 1
Ruisheng Wang 2
Jing Ma 2
Chao Jiang 2
Jiali Mu 2
Shuaifeng Zhao 2
Xiaojun Yin 2
1
 
HB Optical, Shenyang Academy of Instrumentation Science Co., Ltd. , Shenyang 110043 , China
2
 
Shenyang Academy of Instrumentation Science Co., Ltd. , Shenyang , China
Publication typeJournal Article
Publication date2018-03-21
scimago Q2
SJR0.571
CiteScore4.4
Impact factor2.3
ISSN21928576, 21928584
Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Instrumentation
Abstract

Three multilayer interference optical filters, including a UV band-pass, a VIS dual-band-pass and a notch filter, were designed by using Ta2O5, Nb2O5, Al2O3 and SiO2 as high- and low-index materials. During the design of the coating process, a hybrid optical monitoring and RATE-controlled layer thickness control scheme was adopted. The coating process was simulated by using the optical monitoring system (OMS) Simulator, and the simulation result indicated that the layer thickness can be controlled within an error of less than ±0.1%. The three filters were manufactured on a plasma-assisted reactive magnetic sputtering (PARMS) coating machine. The measurements indicate that for the UV band-pass filter, the peak transmittance is higher than 95% and the blocking density is better than OD6 in the 300–1100 nm region, whereas for the dual-band-pass filter, the center wavelength positioning accuracy of the two passbands are less than ±2 nm, the peak transmittance is higher than 95% and blocking density is better than OD6 in the 300–950 nm region. Finally, for the notch filter, the minimum transmittance rates are >90% and >94% in the visible and near infrared, respectively, and the blocking density is better than OD5.5 at 808 nm.

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