Open Access
Open access
volume 12 issue 2 pages 245

Review of Silicon Carbide Processing for Power MOSFET

Catherine Langpoklakpam 1
An-Chen Liu 1
Kuo Hsiung Chu 1
Lung Hsing Hsu 1, 2
Wen Chung Lee 1, 2
Shih-Chen Chen 3
Chia-Wei SUN 1
Min Hsiung Shih 4
Kung Yen Lee 5, 6
Publication typeJournal Article
Publication date2022-02-11
scimago Q2
wos Q2
SJR0.486
CiteScore5.0
Impact factor2.4
ISSN20734352, 01725076
Inorganic Chemistry
General Chemical Engineering
Condensed Matter Physics
General Materials Science
Abstract

Owing to the superior properties of silicon carbide (SiC), such as higher breakdown voltage, higher thermal conductivity, higher operating frequency, higher operating temperature, and higher saturation drift velocity, SiC has attracted much attention from researchers and the industry for decades. With the advances in material science and processing technology, many power applications such as new smart energy vehicles, power converters, inverters, and power supplies are being realized using SiC power devices. In particular, SiC MOSFETs are generally chosen to be used as a power device due to their ability to achieve lower on-resistance, reduced switching losses, and high switching speeds than the silicon counterpart and have been commercialized extensively in recent years. A general review of the critical processing steps for manufacturing SiC MOSFETs, types of SiC MOSFETs, and power applications based on SiC power devices are covered in this paper. Additionally, the reliability issues of SiC power MOSFET are also briefly summarized.

Found 
Found 

Top-30

Journals

1
2
3
4
5
6
Materials Science in Semiconductor Processing
6 publications, 4.44%
Materials
5 publications, 3.7%
Micromachines
5 publications, 3.7%
Energies
4 publications, 2.96%
Journal of Crystal Growth
4 publications, 2.96%
Engineering Research Express
3 publications, 2.22%
ECS Journal of Solid State Science and Technology
3 publications, 2.22%
Journal of Applied Physics
3 publications, 2.22%
Materials Research Express
2 publications, 1.48%
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
2 publications, 1.48%
Applied Surface Science
2 publications, 1.48%
Advanced Materials Interfaces
2 publications, 1.48%
Semiconductor Science and Technology
2 publications, 1.48%
Electronics (Switzerland)
2 publications, 1.48%
Materials Science and Engineering B: Solid-State Materials for Advanced Technology
2 publications, 1.48%
Crystals
2 publications, 1.48%
IEEE Transactions on Power Electronics
2 publications, 1.48%
Ceramics International
2 publications, 1.48%
Micro and Nanostructures
2 publications, 1.48%
Nanotechnology
2 publications, 1.48%
Mathematics
1 publication, 0.74%
Frontiers of Physics
1 publication, 0.74%
Journal of Physics: Conference Series
1 publication, 0.74%
ACS Applied Electronic Materials
1 publication, 0.74%
Journal of the European Optical Society
1 publication, 0.74%
Nuclear Engineering and Technology
1 publication, 0.74%
ACS applied materials & interfaces
1 publication, 0.74%
IEEE Transactions on Nuclear Science
1 publication, 0.74%
Advanced Materials
1 publication, 0.74%
1
2
3
4
5
6

Publishers

5
10
15
20
25
30
35
Institute of Electrical and Electronics Engineers (IEEE)
35 publications, 25.93%
Elsevier
32 publications, 23.7%
MDPI
23 publications, 17.04%
IOP Publishing
12 publications, 8.89%
AIP Publishing
6 publications, 4.44%
Springer Nature
5 publications, 3.7%
American Chemical Society (ACS)
4 publications, 2.96%
American Vacuum Society
3 publications, 2.22%
Wiley
3 publications, 2.22%
The Electrochemical Society
3 publications, 2.22%
Optica Publishing Group
2 publications, 1.48%
EDP Sciences
1 publication, 0.74%
Research Square Platform LLC
1 publication, 0.74%
American Physical Society (APS)
1 publication, 0.74%
Instituto de Aeronautica e Espaco-IAE
1 publication, 0.74%
IntechOpen
1 publication, 0.74%
ASME International
1 publication, 0.74%
Trans Tech Publications
1 publication, 0.74%
5
10
15
20
25
30
35
  • We do not take into account publications without a DOI.
  • Statistics recalculated weekly.

Are you a researcher?

Create a profile to get free access to personal recommendations for colleagues and new articles.
Metrics
135
Share
Cite this
GOST |
Cite this
GOST Copy
Langpoklakpam C. et al. Review of Silicon Carbide Processing for Power MOSFET // Crystals. 2022. Vol. 12. No. 2. p. 245.
GOST all authors (up to 50) Copy
Langpoklakpam C., Liu A., Chu K. H., Hsu L. H., Lee W. C., Chen S., SUN C., Shih M. H., Lee K. Y., Kuo H. Review of Silicon Carbide Processing for Power MOSFET // Crystals. 2022. Vol. 12. No. 2. p. 245.
RIS |
Cite this
RIS Copy
TY - JOUR
DO - 10.3390/cryst12020245
UR - https://doi.org/10.3390/cryst12020245
TI - Review of Silicon Carbide Processing for Power MOSFET
T2 - Crystals
AU - Langpoklakpam, Catherine
AU - Liu, An-Chen
AU - Chu, Kuo Hsiung
AU - Hsu, Lung Hsing
AU - Lee, Wen Chung
AU - Chen, Shih-Chen
AU - SUN, Chia-Wei
AU - Shih, Min Hsiung
AU - Lee, Kung Yen
AU - Kuo, Hao-Chung
PY - 2022
DA - 2022/02/11
PB - MDPI
SP - 245
IS - 2
VL - 12
SN - 2073-4352
SN - 0172-5076
ER -
BibTex |
Cite this
BibTex (up to 50 authors) Copy
@article{2022_Langpoklakpam,
author = {Catherine Langpoklakpam and An-Chen Liu and Kuo Hsiung Chu and Lung Hsing Hsu and Wen Chung Lee and Shih-Chen Chen and Chia-Wei SUN and Min Hsiung Shih and Kung Yen Lee and Hao-Chung Kuo},
title = {Review of Silicon Carbide Processing for Power MOSFET},
journal = {Crystals},
year = {2022},
volume = {12},
publisher = {MDPI},
month = {feb},
url = {https://doi.org/10.3390/cryst12020245},
number = {2},
pages = {245},
doi = {10.3390/cryst12020245}
}
MLA
Cite this
MLA Copy
Langpoklakpam, Catherine, et al. “Review of Silicon Carbide Processing for Power MOSFET.” Crystals, vol. 12, no. 2, Feb. 2022, p. 245. https://doi.org/10.3390/cryst12020245.