Advanced Crystallization Methods for Thin-Film Lithium Niobate and Its Device Applications

Rongbang Yang ¹

Haoming Wei ²

Gongbin Tang ¹

Bingqiang Cao ³

Kunfeng Chen ¹

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Institute of Novel Semiconductors, State Key Laboratory of Crystal Materials, Shandong University, Jinan 250100, China |

Shandong Provincial Key Laboratory of Laser Polarization and Information Technology, School of Physics and Physical Engineering, Qufu Normal University, Qufu 273165, China |

School of Materials Science And Engineering, University of Jinan, Jinan 250022, China |

Publication type: Journal Article

Publication date: 2025-02-21

MDPI

Journal: Materials

scimago Q2

SJR: 0.565

CiteScore: 5.8

Impact factor: 3.1

ISSN: 19961944

DOI: 10.3390/ma18050951

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Abstract

Lithium niobate (LiNbO3) has remarkable ferroelectric properties, and its unique crystal structure allows it to undergo significant spontaneous polarization. Lithium niobate plays an important role in the fields of electro-optic modulation, sensing and acoustics due to its excellent electro-optic and piezoelectric properties. Thin-film LiNbO3 (TFLN) has attracted much attention due to its unique physical properties, stable properties and easy processing. This review introduces several main preparation methods for TFLN, including chemical vapor deposition (CVD), molecular beam epitaxy (MBE), pulsed laser deposition (PLD), magnetron sputtering and Smartcut technology. The development of TFLN devices, especially the recent research on sensors, memories, optical waveguides and EO modulators, is introduced. With the continuous advancement of manufacturing technology and integration technology, TFLN devices are expected to occupy a more important position in future photonic integrated circuits.