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Crystals, volume 12, issue 1, pages 78

Tailoring Properties of Hafnium Nitride Thin Film via Reactive Gas-Timing RF Magnetron Sputtering for Surface Enhanced-Raman Scattering Substrates

Nguentra Sucheewa 1
Winadda Wongwiriyapan 1
A. Klamchuen 2
Michiko Obata 3
Masatsugu Fujishige 4
Kenji Takeuchi 3, 5
TOSSAPORN LERTVANITHPHOL 6
TUKSADON WUTIKHUN 2
Saifon Kullyakool 2
Wanwalee Auttasiri 7
Nataporn Sowasod 7
Theerayut Prataen 7
Wiwut Tanthapanichakoon 8
JITI NUKEAW 1
Publication typeJournal Article
Publication date2022-01-06
Journal: Crystals
Quartile SCImago
Q2
Quartile WOS
Q2
Impact factor2.7
ISSN20734352, 01725076, 20734352
Inorganic Chemistry
General Chemical Engineering
Condensed Matter Physics
General Materials Science
Abstract

This study successfully demonstrated the tailoring properties of hafnium nitride (HfN) thin films via reactive gas-timing (RGT) RF magnetron sputtering for surface-enhanced Raman spectroscopy (SERS) substrate applications. The optimal RGT sputtering condition was investigated by varying the duration time of the argon and nitrogen gas sequence. The RGT technique formed thin films with a grain size of approximately 15 nm. Additionally, the atomic ratios of nitrogen and hafnium can be controlled between 0.24 and 0.28, which is greater than the conventional technique, resulting in a high absorbance in the long wavelength region. Moreover, the HfN thin film exhibited a high Raman signal intensity with an EF of 8.5 × 104 to methylene blue molecules and was capable of being reused five times. A superior performance of HfN as a SERS substrate can be attributed to its tailored grain size and chemical composition, which results in an increase in the hot spot effect. These results demonstrate that the RGT technique is a viable method for fabricating HfN thin films with controlled properties at room temperature, which makes them an attractive material for SERS and other plasmonic applications.

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GOST Copy
Sucheewa N. et al. Tailoring Properties of Hafnium Nitride Thin Film via Reactive Gas-Timing RF Magnetron Sputtering for Surface Enhanced-Raman Scattering Substrates // Crystals. 2022. Vol. 12. No. 1. p. 78.
GOST all authors (up to 50) Copy
Sucheewa N., Wongwiriyapan W., Klamchuen A., Obata M., Fujishige M., Takeuchi K., LERTVANITHPHOL T., WUTIKHUN T., Kullyakool S., Auttasiri W., Sowasod N., Prataen T., Tanthapanichakoon W., NUKEAW J. Tailoring Properties of Hafnium Nitride Thin Film via Reactive Gas-Timing RF Magnetron Sputtering for Surface Enhanced-Raman Scattering Substrates // Crystals. 2022. Vol. 12. No. 1. p. 78.
RIS |
Cite this
RIS Copy
TY - JOUR
DO - 10.3390/cryst12010078
UR - https://doi.org/10.3390/cryst12010078
TI - Tailoring Properties of Hafnium Nitride Thin Film via Reactive Gas-Timing RF Magnetron Sputtering for Surface Enhanced-Raman Scattering Substrates
T2 - Crystals
AU - Sucheewa, Nguentra
AU - Wongwiriyapan, Winadda
AU - Obata, Michiko
AU - Fujishige, Masatsugu
AU - Takeuchi, Kenji
AU - LERTVANITHPHOL, TOSSAPORN
AU - WUTIKHUN, TUKSADON
AU - Kullyakool, Saifon
AU - Auttasiri, Wanwalee
AU - Sowasod, Nataporn
AU - Prataen, Theerayut
AU - Tanthapanichakoon, Wiwut
AU - NUKEAW, JITI
AU - Klamchuen, A.
PY - 2022
DA - 2022/01/06 00:00:00
PB - Multidisciplinary Digital Publishing Institute (MDPI)
SP - 78
IS - 1
VL - 12
SN - 2073-4352
SN - 0172-5076
SN - 2073-4352
ER -
BibTex |
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BibTex Copy
@article{2022_Sucheewa,
author = {Nguentra Sucheewa and Winadda Wongwiriyapan and Michiko Obata and Masatsugu Fujishige and Kenji Takeuchi and TOSSAPORN LERTVANITHPHOL and TUKSADON WUTIKHUN and Saifon Kullyakool and Wanwalee Auttasiri and Nataporn Sowasod and Theerayut Prataen and Wiwut Tanthapanichakoon and JITI NUKEAW and A. Klamchuen},
title = {Tailoring Properties of Hafnium Nitride Thin Film via Reactive Gas-Timing RF Magnetron Sputtering for Surface Enhanced-Raman Scattering Substrates},
journal = {Crystals},
year = {2022},
volume = {12},
publisher = {Multidisciplinary Digital Publishing Institute (MDPI)},
month = {jan},
url = {https://doi.org/10.3390/cryst12010078},
number = {1},
pages = {78},
doi = {10.3390/cryst12010078}
}
MLA
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MLA Copy
Sucheewa, Nguentra, et al. “Tailoring Properties of Hafnium Nitride Thin Film via Reactive Gas-Timing RF Magnetron Sputtering for Surface Enhanced-Raman Scattering Substrates.” Crystals, vol. 12, no. 1, Jan. 2022, p. 78. https://doi.org/10.3390/cryst12010078.
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