volume 33 issue 6 pages 160-163

Effects of Chamber Wall Contamination Levels on Plasma Properties in Long-Term C4F8/Ar Plasma Deposition Processes

Publication typeJournal Article
Publication date2024-11-30
scimago Q3
wos Q4
SJR0.270
CiteScore1.8
Impact factor0.9
ISSN22886559, 12258822
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Park W. et al. Effects of Chamber Wall Contamination Levels on Plasma Properties in Long-Term C4F8/Ar Plasma Deposition Processes // Applied Science and Convergence Technology. 2024. Vol. 33. No. 6. pp. 160-163.
GOST all authors (up to 50) Copy
Park W., PARK S., Moon S. Y. Effects of Chamber Wall Contamination Levels on Plasma Properties in Long-Term C4F8/Ar Plasma Deposition Processes // Applied Science and Convergence Technology. 2024. Vol. 33. No. 6. pp. 160-163.
RIS |
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TY - JOUR
DO - 10.5757/asct.2024.33.6.160
UR - http://www.e-asct.org/journal/view.html?doi=10.5757/ASCT.2024.33.6.160
TI - Effects of Chamber Wall Contamination Levels on Plasma Properties in Long-Term C4F8/Ar Plasma Deposition Processes
T2 - Applied Science and Convergence Technology
AU - Park, Woojin
AU - PARK, SANGJUN
AU - Moon, Se Youn
PY - 2024
DA - 2024/11/30
PB - The Korean Vacuum Society
SP - 160-163
IS - 6
VL - 33
SN - 2288-6559
SN - 1225-8822
ER -
BibTex |
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BibTex (up to 50 authors) Copy
@article{2024_Park,
author = {Woojin Park and SANGJUN PARK and Se Youn Moon},
title = {Effects of Chamber Wall Contamination Levels on Plasma Properties in Long-Term C4F8/Ar Plasma Deposition Processes},
journal = {Applied Science and Convergence Technology},
year = {2024},
volume = {33},
publisher = {The Korean Vacuum Society},
month = {nov},
url = {http://www.e-asct.org/journal/view.html?doi=10.5757/ASCT.2024.33.6.160},
number = {6},
pages = {160--163},
doi = {10.5757/asct.2024.33.6.160}
}
MLA
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Park, Woojin, et al. “Effects of Chamber Wall Contamination Levels on Plasma Properties in Long-Term C4F8/Ar Plasma Deposition Processes.” Applied Science and Convergence Technology, vol. 33, no. 6, Nov. 2024, pp. 160-163. http://www.e-asct.org/journal/view.html?doi=10.5757/ASCT.2024.33.6.160.